Growth and characterization of Na0.5K0.5NbO3 thin films on polycrystalline Pt80Ir20 substrates

• Na0.5K0.5NbO3 thin films have been deposited onto textured polycrystalline Pt80Ir20 substrates using radio frequency magnetron sputtering. Films were grown in off- and on-axis positions relative to the target at growth temperatures of 500-700 degreesC and sputtering pressures of 1-7 Pa. The deposited films were found to be textured, displaying a mixture of two orientations (001) and (101). Films grown on-axis showed a prefered (001) orientation, while the off-axis films had a (101) orientation. Scanning electron microscopy showed that the morphology of the films was dependent on the substrate position and sputtering pressure. The low-frequency (10 kHz) dielectric constants of the films were found to be in the range of approximately 490-590. Hydrostatic piezoelectric measurements showed that the films were piezoelectric in the as-deposited form with a constant up to 14.5 pC/N.

Keyword

sputter-deposition

epitaxial-growth

mgo

TECHNOLOGY

Publication and Content Type

ref (subject category)

art (subject category)