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Inkjet-printing of graphene saturable absorbers for similar to 2 mu m bulk and waveguide lasers

Loiko, Pavel (author)
ITMO Univ, Kronverkskiy Pr 49, St Petersburg 197101, Russia.
Maria Serres, Josep (author)
URV, Dept Quim Fis & Inorgan, Fis & Cristal Lografia Mat & Nanomat FiCMA FiCNA, EMaS, E-43007 Tarragona, Spain.
Delekta, Szymon Sollami (author)
KTH,Skolan för informations- och kommunikationsteknik (ICT)
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Kifle, Esrom (author)
URV, Dept Quim Fis & Inorgan, Fis & Cristal Lografia Mat & Nanomat FiCMA FiCNA, EMaS, E-43007 Tarragona, Spain.
Boguslawski, Jakub (author)
Wroclaw Univ Sci & Technol, Fac Elect, Laser & Fiber Elect Grp, Wybrzeze S Wyspianskiego 27, PL-50370 Wroclaw, Poland.;Polish Acad Sci, Inst Phys Chem, Kasprzaka 44-52, PL-01224 Warsaw, Poland.
Kowalczyk, Maciej (author)
Wroclaw Univ Sci & Technol, Fac Elect, Laser & Fiber Elect Grp, Wybrzeze S Wyspianskiego 27, PL-50370 Wroclaw, Poland.
Sotor, Jaroslaw (author)
Wroclaw Univ Sci & Technol, Fac Elect, Laser & Fiber Elect Grp, Wybrzeze S Wyspianskiego 27, PL-50370 Wroclaw, Poland.
Aguilo, Magdalena (author)
URV, Dept Quim Fis & Inorgan, Fis & Cristal Lografia Mat & Nanomat FiCMA FiCNA, EMaS, E-43007 Tarragona, Spain.
Diaz, Francesc (author)
URV, Dept Quim Fis & Inorgan, Fis & Cristal Lografia Mat & Nanomat FiCMA FiCNA, EMaS, E-43007 Tarragona, Spain.
Griebner, Uwe (author)
Max Born Inst Nonlinear Opt & Short Pulse Spect, Max Born Str 2a, D-12489 Berlin, Germany.
Petrov, Valentin (author)
Max Born Inst Nonlinear Opt & Short Pulse Spect, Max Born Str 2a, D-12489 Berlin, Germany.
Popov, Sergei (author)
KTH,Skolan för informations- och kommunikationsteknik (ICT)
Li, Jiantong, 1980- (author)
KTH,Skolan för informations- och kommunikationsteknik (ICT)
Mateos, Xavier (author)
URV, Dept Quim Fis & Inorgan, Fis & Cristal Lografia Mat & Nanomat FiCMA FiCNA, EMaS, E-43007 Tarragona, Spain.
Östling, Mikael (author)
KTH,Skolan för informations- och kommunikationsteknik (ICT)
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ITMO Univ, Kronverkskiy Pr 49, St Petersburg 197101, Russia URV, Dept Quim Fis & Inorgan, Fis & Cristal Lografia Mat & Nanomat FiCMA FiCNA, EMaS, E-43007 Tarragona, Spain. (creator_code:org_t)
Optical Society of America, 2018
2018
English.
In: Optical Materials Express. - : Optical Society of America. - 2159-3930 .- 2159-3930. ; 8:9, s. 2803-2814
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • A technique for inkjet-printing of graphene saturable absorbers (SAs) for similar to 2-mu m bulk and waveguide lasers is presented. Based on distillation-assisted solvent exchange to fabricate high-concentration graphene inks, this technique is capable of producing few-layer graphene films of arbitrary shape. Absorption saturation of graphene printed on glass is demonstrated at similar to 1.56 mu m for picosecond and femtosecond pulses indicating a large fraction of the saturable losses. Inkjet-printed transmission-type graphene SAs are applied in passively Q-switched nanosecond thulium (Tm) microchip and planar waveguide lasers. The Tm microchip laser generates 136 ns / 1.2 mu J pulses at 1917 nm with a repetition rate of 0.37 MHz with a Q-switching conversion efficiency reaching 65%. The planar waveguide laser generates 98 ns / 21 nJ pulses at 1834 nm at a repetition rate in the MHz-range. The inkjet-printing technique is promising for production of patterned SAs for waveguide lasers.

Subject headings

NATURVETENSKAP  -- Fysik -- Atom- och molekylfysik och optik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences -- Atom and Molecular Physics and Optics (hsv//eng)

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art (subject category)

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