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Spatial and spectra...
Spatial and spectral characterization of a laser produced plasma source for extreme ultraviolet metrology
- Article/chapterEnglish2004
Publisher, publication year, extent ...
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AIP Publishing,2004
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printrdacarrier
Numbers
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LIBRIS-ID:oai:DiVA.org:kth-23868
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https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-23868URI
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https://doi.org/10.1063/1.1807567DOI
Supplementary language notes
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Language:English
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Summary in:English
Part of subdatabase
Classification
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Subject category:ref swepub-contenttype
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Subject category:art swepub-publicationtype
Notes
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QC 20100525
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We present a laser produced plasma (LPP) source optimized for metrology and the results of its radiometric characterization. The presented (LPP) source can be used for reflectometry and spectroscopy in the soft x-ray range. For these applications, stable operation with high spectral photon yields high reliability in continuous operation and, to reach high spectral resolution, a small source size and high source point stability is necessary. For the characterization of the source, special instruments have been designed and calibrated using the soft x-ray radiometry beamline of the Physikalisch-Technische-Bundesanstalt at BESSY. These instruments are an imaging spectrometer, a double multilayer tool for in-band power measurements, a transmission slit grating spectrograph, and a pinhole camera. From the measurements a source size of 30 mumx55 mum (2sigma, horizontal by vertical) and a stability of better than 5 mum horizontally and 9 mum vertically were obtained. The source provides a flat continuous emission in the extreme ultraviolet (EUV) range around 13.4 nm and a spectral photon flux of up to 1*10(14)/(s sr 0.1 nm) at a pump laser pulse energy of 650 mJ. The shot-to-shot stability of the source is about 5% (1sigma) for laser pulse energies above 200 mJ. It is shown that an Au-LPP source provides spectrally reproducible emission with sufficient power at low debris conditions for the operation of a laboratory based EUV reflectometer and for spectroscopy.
Subject headings and genre
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x-ray-absorption
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laboratory euv reflectometer
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high average power
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lithography applications
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excimer-laser
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light-source
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spectroscopy
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emission
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clusters
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debris
Added entries (persons, corporate bodies, meetings, titles ...)
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Stiel, H.
(author)
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Vogt, Ulrich
(author)
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Schonnagel, H.
(author)
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Nickles, P. V.
(author)
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Tummler, J.
(author)
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Scholz, F.
(author)
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Scholze, F.
(author)
Related titles
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In:Review of Scientific Instruments: AIP Publishing75:11, s. 4981-49880034-67481089-7623
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