Sökning: onr:"swepub:oai:DiVA.org:kth-23868" >
Spatial and spectra...
Spatial and spectral characterization of a laser produced plasma source for extreme ultraviolet metrology
- Artikel/kapitelEngelska2004
Förlag, utgivningsår, omfång ...
-
AIP Publishing,2004
-
printrdacarrier
Nummerbeteckningar
-
LIBRIS-ID:oai:DiVA.org:kth-23868
-
https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-23868URI
-
https://doi.org/10.1063/1.1807567DOI
Kompletterande språkuppgifter
-
Språk:engelska
-
Sammanfattning på:engelska
Ingår i deldatabas
Klassifikation
-
Ämneskategori:ref swepub-contenttype
-
Ämneskategori:art swepub-publicationtype
Anmärkningar
-
QC 20100525
-
We present a laser produced plasma (LPP) source optimized for metrology and the results of its radiometric characterization. The presented (LPP) source can be used for reflectometry and spectroscopy in the soft x-ray range. For these applications, stable operation with high spectral photon yields high reliability in continuous operation and, to reach high spectral resolution, a small source size and high source point stability is necessary. For the characterization of the source, special instruments have been designed and calibrated using the soft x-ray radiometry beamline of the Physikalisch-Technische-Bundesanstalt at BESSY. These instruments are an imaging spectrometer, a double multilayer tool for in-band power measurements, a transmission slit grating spectrograph, and a pinhole camera. From the measurements a source size of 30 mumx55 mum (2sigma, horizontal by vertical) and a stability of better than 5 mum horizontally and 9 mum vertically were obtained. The source provides a flat continuous emission in the extreme ultraviolet (EUV) range around 13.4 nm and a spectral photon flux of up to 1*10(14)/(s sr 0.1 nm) at a pump laser pulse energy of 650 mJ. The shot-to-shot stability of the source is about 5% (1sigma) for laser pulse energies above 200 mJ. It is shown that an Au-LPP source provides spectrally reproducible emission with sufficient power at low debris conditions for the operation of a laboratory based EUV reflectometer and for spectroscopy.
Ämnesord och genrebeteckningar
-
x-ray-absorption
-
laboratory euv reflectometer
-
high average power
-
lithography applications
-
excimer-laser
-
light-source
-
spectroscopy
-
emission
-
clusters
-
debris
Biuppslag (personer, institutioner, konferenser, titlar ...)
-
Stiel, H.
(författare)
-
Vogt, Ulrich
(författare)
-
Schonnagel, H.
(författare)
-
Nickles, P. V.
(författare)
-
Tummler, J.
(författare)
-
Scholz, F.
(författare)
-
Scholze, F.
(författare)
Sammanhörande titlar
-
Ingår i:Review of Scientific Instruments: AIP Publishing75:11, s. 4981-49880034-67481089-7623
Internetlänk
Hitta via bibliotek
Till lärosätets databas