The nature of self-assembled octadecylphosphonic acid (ODPA) layers on copper substrates

Zhao, WeijieKTH,Yt- och korrosionsvetenskap,KTH Royal Inst Technol, Dept Chem, Div Surface & Corros Sci, SE-10044 Stockholm, Sweden. (författare)

QC 20201202
Hypothesis: The self-assembly of amphiphilic molecules onto solid substrates can result both in the formation of monolayers and multilayers. However, on oxidized and non-oxidized copper (Cu), only monolayer formation was reported for phosphonic acids possessing one phosphate head group. Here, the adsorption of octadecylphosphonic acid (ODPA) on Cu substrates through a self-assembly process was investigated with the initial hypothesis of monolayer formation. Experiments: The relative amount of ODPA adsorbed on a Cu substrate was determined by infrared reflection/absorption spectroscopy (IRRAS) and by atomic force microscopy (AFM) investigations before and after ODPA deposition. X-ray photoelectron spectroscopy (XPS) with sputtering was used to characterize the nature of the layers. Findings: The results show that the thickness of the ODPA layer increased with deposition time, and after 1 h a multilayer film with a thickness of some tens of nm was formed. The film was robust and required long-time sonication for removal. The origin of the film robustness was attributed to the release of Cu ions, resulting in the formation of Cu-ODPA complexes with Cu ions in the form of Cu(I). Preadsorbing a monolayer of octadecylthiol (ODT) onto the Cu resulted in no ODPA adsorption, since the release of Cu(I) ions was abolished.

Göthelid, MatsKTH,Material- och nanofysik,KTH Royal Inst Technol, Dept Appl Phys Mat & Nano Phys, SE-16440 Stockholm, Sweden.(Swepub:kth)u1uq5dqb (författare)
Hosseinpour, SamanInstitute of Particle Technology (LFG), Friedrich-Alexander-Universität-Erlangen-Nürnberg (FAU), 91058 Erlangen, Germany,Friedrich Alexander Univ Erlangen Nurnberg FAU, Inst Particle Technol LFG, D-91058 Erlangen, Germany. (författare)
Johansson, Malin B,1972-Uppsala universitet,Fysikalisk kemi(Swepub:uu)maljo942 (författare)
Li, GenKTH,Yt- och korrosionsvetenskap,KTH Royal Inst Technol, Dept Chem, Div Surface & Corros Sci, SE-10044 Stockholm, Sweden.(Swepub:kth)u15g2vse (författare)
Leygraf, Christopher,1946-KTH,Yt- och korrosionsvetenskap,KTH Royal Inst Technol, Dept Chem, Div Surface & Corros Sci, SE-10044 Stockholm, Sweden.(Swepub:kth)u1itk7c9 (författare)
Johnson, C. MagnusKTH,Yt- och korrosionsvetenskap,KTH Royal Inst Technol, Dept Chem, Div Surface & Corros Sci, SE-10044 Stockholm, Sweden.(Swepub:kth)u1swbnpr (författare)
KTHYt- och korrosionsvetenskap (creator_code:org_t)

Ingår i:Journal of Colloid and Interface Science: Academic Press Inc.581, s. 816-8250021-97971095-7103

Av författaren/redakt...: Zhao, Weijie; Göthelid, Mats; Hosseinpour, Sam ...; Johansson, Malin ...; Li, Gen; Leygraf, Christo ...; visa fler...; Johnson, C. Magn ...; visa färre...

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