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  • Eliasson, H.Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten (author)

Modeling of high power impulse magnetron sputtering discharges with graphite target

  • Article/chapterEnglish2021

Publisher, publication year, extent ...

  • 2021-11-30
  • IOP Publishing Ltd,2021
  • printrdacarrier

Numbers

  • LIBRIS-ID:oai:DiVA.org:kth-306575
  • https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-306575URI
  • https://doi.org/10.1088/1361-6595/ac352cDOI
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-181787URI

Supplementary language notes

  • Language:English
  • Summary in:English

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Classification

  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • QC 20211220
  • Funding Agencies|Free State of Saxony; European Regional Development FundEuropean Commission [100336119]; Icelandic Research Fund [196141]; Swedish Research CouncilSwedish Research CouncilEuropean Commission [VR 201804139]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University (Faculty Grant SFO-Mat-LiU) [2009-00971]
  • The ionization region model (IRM) is applied to model a high power impulse magnetron sputtering discharge in argon with a graphite target. Using the IRM, the temporal variation of the various species and the average electron energy, as well as internal parameters such as the ionization probability, back-attraction probability, and the ionized flux fraction of the sputtered species, is determined. It is found that thedischarge develops into working gas recycling and most of the discharge current at the cathode target surface is composed of Ar+ ions, which constitute over 90% of the discharge current, while the contribution of the C+ ions is always small (<5%), even for peak current densities close to 3 A cm(-2). For the target species, the time-averaged ionization probability is low, or 13-27%, the ion back-attraction probability during the pulse is high (>92%), and the ionized flux fraction is about 2%. It is concluded that in the operation range studied here it is a challenge to ionize carbon atoms, that are sputtered off of a graphite target in a magnetron sputtering discharge, when depositing amorphous carbon films.

Subject headings and genre

Added entries (persons, corporate bodies, meetings, titles ...)

  • Rudolph, M.Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany. (author)
  • Brenning, NilsLinköpings universitet,KTH,Rymd- och plasmafysik,Linköping Univ, Plasma & Coatings Phys Div, IFM Mat Phys, SE-58183 Linköping, Sweden.,Plasma och ytbeläggningsfysik,Tekniska fakulteten,KTH Royal Inst Technol, Sweden(Swepub:liu)nilbr83 (author)
  • Hajihoseini, H.Univ Twente, MESA Inst Nanotechnol, Ind Focus Grp XUV Opt, Drienerlolaan 5, NL-7522 NB Enschede, Netherlands. (author)
  • Zanaska, MichalLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)micza83 (author)
  • Adriaans, M. J.Eindhoven Univ Technol, Dept Appl Phys, Eindhoven, Netherlands. (author)
  • Raadu, Michael A.KTH,Rymd- och plasmafysik,KTH Royal Inst Technol, Sweden(Swepub:kth)u1ajzw7w (author)
  • Minea, T. M.Univ Paris Saclay, Lab Phys Gaz & Plasmas LPGP, CNRS, UMR 8578, F-91405 Orsay, France. (author)
  • Gudmundsson, Jon Tomas,1965-KTH,Rymd- och plasmafysik,Univ Iceland, Sci Inst, Dunhaga 3, IS-107 Reykjavik, Iceland.,KTH Royal Inst Technol, Sweden; Univ Iceland, Iceland(Swepub:kth)u1q27a34 (author)
  • Lundin, DanielLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)danlu03 (author)
  • Linköpings universitetPlasma och ytbeläggningsfysik (creator_code:org_t)

Related titles

  • In:Plasma sources science & technology: IOP Publishing Ltd30:110963-02521361-6595

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