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  • Fritze, StefanUppsala universitet,Oorganisk kemi,Uppsala University (author)

Elemental distribution and fracture properties of magnetron sputtered carbon supersaturated tungsten films

  • Article/chapterEnglish2024

Publisher, publication year, extent ...

  • Elsevier BV,2024
  • printrdacarrier

Numbers

  • LIBRIS-ID:oai:DiVA.org:kth-342188
  • https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-342188URI
  • https://doi.org/10.1016/j.surfcoat.2023.130326DOI
  • https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-521828URI
  • https://research.chalmers.se/publication/539608URI

Supplementary language notes

  • Language:English
  • Summary in:English

Part of subdatabase

Classification

  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • QC 20240115
  • The combination of strength and toughness is a major driving force for alloy design of protective coatings, and nanocrystalline tungsten (W)-alloys have shown to be promising candidates for combining strength and toughness. Here we investigate the elemental distribution and the fracture toughness of carbon (C) alloyed W thin films prepared by non-reactive magnetron sputtering. W:C films with up to ~4 at.% C crystallize in a body-centered-cubic structure with a strong 〈hh0〉texture, and no additional carbide phases are observed in the diffraction pattern. Atom probe tomography and X-ray photoelectron spectroscopy confirmed the formation of such a supersaturated solid solution. The pure W film has a hardness ~13 GPa and the W:C films exhibit a peak hardness of ~24 GPa. In-situ micromechanical cantilever bending tests show that the fracture toughness decreases from ~4.5 MPa·m1/2 for the W film to ~3.1 MPa·m1/2 for W:C films. The results show that C can significantly enhance the hardness of W thin films while retaining a high fracture toughness.

Subject headings and genre

Added entries (persons, corporate bodies, meetings, titles ...)

  • Hahn, R.Institute of Materials Science and Technology, TU Wien, A-1060 Vienna, Austria,Technische Universität Wien,Vienna University of Technology (author)
  • Aboulfadl, Hisham,1986Department of Physics, Chalmers University of Technology, SE-412 96 Göteborg, Sweden,Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)ahisham (author)
  • Johansson, FredrikKTH,Tillämpad fysikalisk kemi,Division of Applied Physical Chemistry, Department of Chemistry, KTH – Royal Institute of Technology, SE-100 44 Stockholm, Sweden; Institute Methods and Instrumentation for Synchrotron Radiation Research PS-ISRR, Helmholtz-Zentrum Berlin für Materialien und Energie, Albert-Einstein-Straße 15, 12489 Berlin, Germany; Institut für Physik und Astronomie, Universität Potsdam, Karl-Liebknecht-Strasse 24-25, 14476 Potsdam, Germany,Universität Potsdam,University of Potsdam,Kungliga Tekniska Högskolan (KTH),Royal Institute of Technology (KTH),Helmholtz Zentrum,Helmholtz Center(Swepub:uu)frejo210 (author)
  • Lindblad, Rebecka,Dr,1984-Uppsala universitet,Institutionen för kemi - Ångström,Uppsala University(Swepub:uu)rebsc244 (author)
  • Böör, KatalinUppsala universitet,Oorganisk kemi,Uppsala University(Swepub:uu)katbo765 (author)
  • Lindblad, Andreas,Lecturer,1978-Uppsala universitet,Energimaterialens fysik,Uppsala University(Swepub:uu)anlin087 (author)
  • Berggren, ElinUppsala universitet,Energimaterialens fysik,Uppsala University(Swepub:uu)elibe358 (author)
  • Kühn, D.Institute Methods and Instrumentation for Synchrotron Radiation Research PS-ISRR, Helmholtz-Zentrum Berlin für Materialien und Energie, Albert-Einstein-Straße 15, 12489, Berlin, Germany, Albert-Einstein-Straße 15,Helmholtz Zentrum,Helmholtz Center (author)
  • Leitner, T.Institute Methods and Instrumentation for Synchrotron Radiation Research PS-ISRR, Helmholtz-Zentrum Berlin für Materialien und Energie, Albert-Einstein-Straße 15, 12489, Berlin, Germany, Albert-Einstein-Straße 15,Helmholtz Zentrum,Helmholtz Center (author)
  • Osinger, BarbaraUppsala universitet,Oorganisk kemi,Uppsala University(Swepub:uu)baros344 (author)
  • Lewin, Erik,Dr.1979-Uppsala universitet,Oorganisk kemi,Uppsala University(Swepub:uu)leeri169 (author)
  • Jansson, Ulf,1960-Uppsala universitet,Oorganisk kemi,Uppsala University(Swepub:uu)uja03434 (author)
  • Mayrhofer, P. H.Institute of Materials Science and Technology, TU Wien, A-1060 Vienna, Austria,Technische Universität Wien,Vienna University of Technology (author)
  • Thuvander, Mattias,1968Department of Physics, Chalmers University of Technology, SE-412 96 Göteborg, Sweden,Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)matthu (author)
  • Uppsala universitetOorganisk kemi (creator_code:org_t)

Related titles

  • In:Surface & Coatings Technology: Elsevier BV4770257-89721879-3347

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