Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation

• Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core.

Nyckelord

Anisotropy

Compressive stress

Plasma enhanced chemical vapor deposition

Ultraviolet radiation

TECHNOLOGY

TEKNIKVETENSKAP

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