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Search: L773:0255 5476 OR L773:1662 9752 OR L773:9783038354789 > Junction barrier Sc...

Junction barrier Schottky diodes in 4H-SiC and 6H-SiC

Dahlquist, Fanny (author)
Zetterling, Carl-Mikael (author)
KTH,Integrerade komponenter och kretsar
Östling, Mikael (author)
KTH,Integrerade komponenter och kretsar
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Rottner, K. (author)
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 (creator_code:org_t)
Trans Tech Publications Inc. 1998
1998
English.
In: Materials Science Forum. - : Trans Tech Publications Inc.. - 0255-5476 .- 1662-9752. ; 264-268:PART 2, s. 1061-1064
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • The Junction Barrier Schottky (JBS) diode in silicon carbide is a promising candidate for a low-leakage power rectifier for high switching frequencies and elevated temperature operation. It has the advantage of a low forward voltage drop while keeping a low leakage current at high blocking voltage. JBS devices have been fabricated in 4H SiC and 6H SiC and then electrically characterised in comparison with pn and Schottky diodes on the same wafer. The JBS devices reached blocking voltages up to 1.0 kV at a leakage current density of 13 ÎŒA/cm2 and the forward conduction was limited by an on-resistance close to the theoretical value.

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)

Keyword

Junction Barrier Schottky
Power Rectifier
Current density
Electric rectifiers
Leakage currents
Power electronics
Semiconducting silicon compounds
Semiconductor junctions
Silicon carbide
Forward voltage drop
Power rectifiers
Schottky barrier diodes

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ref (subject category)
art (subject category)

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Dahlquist, Fanny
Zetterling, Carl ...
Östling, Mikael
Rottner, K.
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ENGINEERING AND TECHNOLOGY
ENGINEERING AND ...
and Electrical Engin ...
and Other Electrical ...
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Materials Scienc ...
By the university
Royal Institute of Technology

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