Interferometric lithography with an amplitude division interferometer and a desktop extreme ultraviolet laser

• We demonstrate a compact interferometric lithography nanopatterning tool based on an amplitude division interferometer (ADI) and a 46.9 nm wavelength desktop size capillary discharge laser. The system is designed to print arrays of lines, holes, and dots with sizes below 100 nm on high resolution photoresists for the fabrication of arrays of nanostructures with physical and biological applications. The future combination of this ADI with high repetition rate tabletop lasers operating at shorter wavelengths should allow the printing of arrays of sub-10 nm size features with a tabletop setup.

Ämnesord

NATURVETENSKAP  -- Fysik -- Atom- och molekylfysik och optik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences -- Atom and Molecular Physics and Optics (hsv//eng)

Nyckelord

UV

EUV

and X-ray lasers ; Nanostructure fabrication

Publikations- och innehållstyp

ref (ämneskategori)

art (ämneskategori)