A strategy for increased carbon ionization in magnetron sputtering discharges

• A strategy that facilitates a substantial increase of carbon ionization in magnetron sputtering discharges is presented in this work. The strategy is based on increasing the electron temperature in a high power impulse magnetron sputtering discharge by using Ne as the sputtering gas. This allows for the generation of an energetic C+ ion population and a substantial increase in the C+ ion flux as compared to a conventional Ar-HiPIMS process. A direct consequence of the ionization enhancement is demonstrated by an increase in the mass density of the grown films up to 2.8 g/cm(3); the density values achieved are substantially higher than those obtained from conventional magnetron sputtering methods.

Ämnesord

NATURVETENSKAP  -- Fysik -- Fusion, plasma och rymdfysik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences -- Fusion, Plasma and Space Physics (hsv//eng)

Nyckelord

HiPIMS

HPPMS

Carbon ionization

Tetrahedral amorphous carbon

Diamond-like carbon

Publikations- och innehållstyp

ref (ämneskategori)

art (ämneskategori)