Gas rarefaction effects during high power pulsed magnetron sputtering of groups IVb and VIb transition metals in Ar

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Greczynski, Grzegorz,1973-Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten (författare)

Gas rarefaction effects during high power pulsed magnetron sputtering of groups IVb and VIb transition metals in Ar

Artikel/kapitelEngelska2017

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American Institute of Physics (AIP),2017
electronicrdacarrier

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LIBRIS-ID:oai:DiVA.org:liu-143365
https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-143365URI
https://doi.org/10.1116/1.4989674DOI

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Språk:engelska
Sammanfattning på:engelska

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Ämneskategori:ref swepub-contenttype
Ämneskategori:art swepub-publicationtype

Anmärkningar

Funding Agencies|Swedish Research Council VR [2014-5790]; Aforsk Foundation [16-359]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [2009 00971]; Knut and Alice Wallenberg Foundation [KAW 2015.0043]
The authors use energy- and time-dependent mass spectrometry to analyze the evolution of metal- and gas-ion fluxes incident at the substrate during high-power pulsed magnetron sputtering (HiPIMS) of groups IVb and VIb transition-metal (TM) targets in Ar. For all TMs, the time-and energy-integrated metal/gas-ion ratio at the substrate plane NMe+/NAr+ increases with increasing peak target current density J(T,peak) due to rarefaction. In addition, NMe+/NAr+ exhibits a strong dependence on metal/gas-atom mass ratio m(Me)/m(g) and varies from similar to 1 for Ti (m(Ti)/m(Ar) = 1.20) to similar to 100 for W (m(W)/m(Ar) = 4.60), with J(T,peak) maintained constant at 1 A/cm(2). Time-resolved ion-energy distribution functions confirm that the degree of rarefaction scales with m(Me)/m(g): for heavier TMs, the original sputtered-atom Sigmund-Thompson energy distributions are preserved long after the HiPIMS pulse, which is in distinct contrast to lighter metals for which the energy distributions collapse into a narrow thermalized peak. Hence, precise timing of synchronous substrate-bias pulses, applied in order to reduce film stress while increasing densification, is critical for metal/gas combinations with m(Me)/m(g) near unity, while with m(Me)/m(g) amp;gt;amp;gt; 1, the width of the synchronous bias pulse is essentially controlled by the metal-ion time of flight. The good agreement between results obtained in an industrial system employing 440 cm(2) cathodes and a laboratory-scale system with a 20 cm(2) target is indicative of the fundamental nature of the phenomena.

Ämnesord och genrebeteckningar

NATURVETENSKAP Fysik Den kondenserade materiens fysik hsv//swe
NATURAL SCIENCES Physical Sciences Condensed Matter Physics hsv//eng
Time of flight mass spectrometry
Metalloids
Wave mechanics
Physical vapor deposition
Semiconductor device fabrication

Biuppslag (personer, institutioner, konferenser, titlar ...)

Zhirkov, Igor,1980-Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)igozh06 (författare)
Petrov, Ivan,1949-Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,University of Illinois, IL 61801 USA; University of Illinois, IL 61801 USA(Swepub:liu)ivape26 (författare)
Greene, Joseph E,1944-Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,University of Illinois, IL 61801 USA; University of Illinois, IL 61801 USA; University of Illinois, IL 61801 USA(Swepub:liu)josgr17 (författare)
Rosén, Johanna,1975-Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)johro07 (författare)
Linköpings universitetTunnfilmsfysik (creator_code:org_t)

Sammanhörande titlar

Ingår i:Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films: American Institute of Physics (AIP)35:60734-21011520-8559

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Av författaren/redakt...: Greczynski, Grze ...; Zhirkov, Igor, 1 ...; Petrov, Ivan, 19 ...; Greene, Joseph E ...; Rosén, Johanna, ...

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Av lärosätet: Linköpings universitet

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