Deep levels in as-grown and electron-irradiated n-type GaN studied by deep level transient spectroscopy and minority carrier transient spectroscopy

• By minority carrier transient spectroscopy on as-grown n-type bulk GaN produced by halide vapor phase epitaxy (HVPE) one hole trap labelled H1 (EV + 0.34 eV) has been detected. After 2 MeV-energy electron irradiation, the concentration of H1 increases and at fluences higher than 5×1014 cm-2, a second hole trap labelled H2 is observed. Simultaneously, the concentration of two electron traps, labelled T1 (EC - 0.12 eV) and T2 (EC - 0.23 eV) increases. By studying the increase of the concentration versus electron irradiation fluences, the introduction rate of T1 and T2 using 2 MeV-energy electrons was determined to 7X10-3 cm-1 and 0.9 cm-1, respectively. Due to the low introduction rate of T1 and the low threading dislocation density in the HVPE bulk GaN material, it is suggested that the defect is associated with a primary defect decorating extended structural defects. The high introduction rate of the trap H1 suggests that the H1 defect is associated with a primary intrinsic defect or a complex.

Ämnesord

NATURVETENSKAP  -- Fysik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences (hsv//eng)

Nyckelord

Deep level

GaN

DLTS

irradiation

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