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Novel hard, tough H...
Novel hard, tough HfAlSiN multilayers, defined by alternating Si bond structure, deposited using modulated high-flux, low-energy ion irradiation of the growing film
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- Fager, Hanna (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Howe, Brandon M. (författare)
- US Air Force, OH 45433 USA
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- Greczynski, Grzegorz (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Jensen, Jens (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Mei, A. B. (författare)
- University of Illinois, IL 61801 USA; University of Illinois, IL 61801 USA
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- Lu, Jun (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Hultman, Lars (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Greene, Joseph E (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,University of Illinois, IL 61801 USA; University of Illinois, IL 61801 USA
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- Petrov, Ivan (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,University of Illinois, IL 61801 USA; University of Illinois, IL 61801 USA
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(creator_code:org_t)
- 2015-05-18
- 2015
- Engelska.
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Ingår i: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : A V S AMER INST PHYSICS. - 0734-2101 .- 1520-8559. ; 33:5, s. 05E103-1-05E103-9
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https://liu.diva-por... (primary) (Raw object)
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https://doi.org/10.1...
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Hf1-x-yAlxSiyN (0 less than= x less than= 0.14, 0 less than= y less than= 0.12) single layer and multilayer films are grown on Si(001) at 250 degrees C using ultrahigh vacuum magnetically unbalanced reactive magnetron sputtering from a single Hf0.6Al0.2Si0.2 target in mixed 5%-N-2/Ar atmospheres at a total pressure of 20 mTorr (2.67 Pa). The composition and nanostructure of Hf1-x-yAlxSiyN films are controlled by varying the energy Ei of the ions incident at the film growth surface while maintaining the ion-to-metal flux ratio constant at eight. Switching E-i between 10 and 40 eV allows the growth of Hf0.78Al0.10Si0.12N/Hf0.78Al0.14Si0.08N multilayers with similar layer compositions, but in which the Si bonding state changes from predominantly Si-Si/Si-Hf for films grown with E-i = 10 eV, to primarily Si-N with E-i = 40 eV. Multilayer hardness values, which vary inversely with bilayer period Lambda, range from 20 GPa with Lambda = 20 nm to 27 GPa with Lambda = 2 nm, while fracture toughness increases directly with Lambda. Multilayers with Lambda = 10nm combine relatively high hardness, H similar to 24GPa, with good fracture toughness. (C) 2015 American Vacuum Society.
Ämnesord
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
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