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  • Imam, MewludeLinköpings universitet,Tekniska fakulteten,Tunnfilmsfysik,European Spallat Source ESS AB, Sweden (author)

Gas phase chemical vapor deposition chemistry of triethylboron probed by boron-carbon thin film deposition and quantum chemical calculations

  • Article/chapterEnglish2015

Publisher, publication year, extent ...

  • 2015
  • ROYAL SOC CHEMISTRY,2015
  • electronicrdacarrier

Numbers

  • LIBRIS-ID:oai:DiVA.org:liu-122673
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-122673URI
  • https://doi.org/10.1039/c5tc02293bDOI
  • https://lup.lub.lu.se/record/8201719URI

Supplementary language notes

  • Language:English
  • Summary in:English

Part of subdatabase

Classification

  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • Funding Agencies|European Spallation Source ESS AB; Knut and Alice Wallenberg Foundation; German Science Foundation (Research Training Group 1782); Beilstein Foundation (Frankfurt/Germany)
  • We present triethylboron (TEB) as a single-source precursor for chemical vapor deposition (CVD) of BxC thin films and study its gas phase chemistry under CVD conditions by quantum chemical calculations. A comprehensive thermochemical catalogue for the species of the gas phase chemistry of TEB is examined and found to be dominated by beta-hydride eliminations of C2H4 to yield BH3. A complementary bimolecular reaction path based on H-2 assisted C2H6 elimination to BH3 is also significant at lower temperatures in the presence of hydrogen. Furthermore, we find a temperature window of 600-1000 degrees C for the deposition of X-ray amorphous BxC films with 2.5 less than= x less than= 4.5 from TEB. Films grown at temperatures below 600 degrees C contain high amounts of H, while temperatures above 1000 degrees C result in C-rich films. The film density and hardness are determined to be in the range of 2.40-2.65 g cm(-3) and 29-39 GPa, respectively, within the determined temperature window.

Subject headings and genre

Added entries (persons, corporate bodies, meetings, titles ...)

  • Gaul, KonstantinUniversity of Marburg, Germany; University of Marburg, Germany (author)
  • Stegmueller, AndreasUniversity of Marburg, Germany; University of Marburg, Germany (author)
  • Höglund, CarinaLinköping University,Lund University,Lunds universitet,Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,European Spallat Source ESS AB, Sweden,European Spallation Source ESS AB,Stiftelser och övriga anknutna verksamheter,Other Institutions and Utilities(Swepub:lu)esss-crh (author)
  • Jensen, JensLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)jenje80 (author)
  • Hultman, LarsLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)larhu75 (author)
  • Birch, JensLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)jenbi91 (author)
  • Tonner, RalfUniversity of Marburg, Germany; University of Marburg, Germany (author)
  • Pedersen, HenrikLinköpings universitet,Kemi,Tekniska fakulteten(Swepub:liu)henpe50 (author)
  • Linköpings universitetTekniska fakulteten (creator_code:org_t)

Related titles

  • In:Journal of Materials Chemistry C: ROYAL SOC CHEMISTRY3:41, s. 10898-109062050-75262050-7534

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