L773:1520 8559 OR L773:0734 2101
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Titanium silicide films prepared by reactive sputtering
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- Blom, Hans-Olof (author)
- Uppsala universitet,Fasta tillståndets elektronik
- Berg, Sören (author)
- Östling, M (author)
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- Petersson, CS (author)
- Deline, V (author)
- d'Heurle, FM (author)
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- (creator_code:org_t)
- 1985
- 1985
- English.
- In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - 0734-2101 .- 1520-8559. ; 3:3, s. 723-
- Journal article (peer-reviewed)
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- ref (subject category)
- art (subject category)
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- Blom, Hans-Olof
- Berg, Sören
- Östling, M
- Petersson, CS
- Deline, V
- d'Heurle, FM
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- Uppsala University
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