Multiple-layered effective medium approximation approach to modeling environmental effects on alumina passivated highly porous silicon nanostructured thin films measured by in-situ Mueller matrix ellipsometry

Funding Agencies|National Science Foundation (NSF) through the Center for Nanohybrid Functional Materials [EPS-1004094]; Nebraska Materials Research Science and Engineering Center [DMR-1420645]; NSF [CMMI 1337856, EAR 1521428]; J.A. Woollam Foundation
Optical changes in alumina passivated highly porous silicon slanted columnar thin films during controlled exposure to toluene vapor are reported. Electron-beam evaporation glancing angle deposition and subsequent atomic layer deposition are utilized to deposit alumina passivated nanostructured porous silicon thin films. In-situ Mueller matrix generalized spectroscopic ellipsometry in an environmental cell is then used to determine changes in optical properties of the nanostructured thin films by inspection of individual Mueller matrix elements, each of which exhibit sensitivity to adsorption. The use of a multiple-layered effective medium approximation model allows for accurate description of the inhomogeneous nature of toluene adsorption onto alumina passivated highly porous silicon slanted columnar thin films. (C) 2016 Elsevier B.V. All rights reserved.

Carlson, TimothyUniversity of Nebraska Lincoln, NE USA (författare)
VanDerslice, JeremyUniversity of Nebraska Lincoln, NE USA; JA Woollam Co Inc, NE USA (författare)
Mohrmann, JoelJA Woollam Co Inc, NE USA (författare)
Woollam, John A.University of Nebraska Lincoln, NE 68588 USA; JA Woollam Co Inc, NE USA (författare)
Schubert, EvaUniversity of Nebraska Lincoln, NE USA (författare)
Schubert, MathiasLinköpings universitet,Halvledarmaterial,Tekniska fakulteten,University of Nebraska Lincoln, NE USA; Leibniz Institute Polymer Research Dresden, Germany(Swepub:liu)schma39 (författare)
University of Nebraska Lincoln, NE USAUniversity of Nebraska Lincoln, NE USA; JA Woollam Co Inc, NE USA (creator_code:org_t)

Ingår i:Applied Surface Science: ELSEVIER SCIENCE BV421, s. 663-6660169-43321873-5584

Av författaren/redakt...: Mock, Alyssa; Carlson, Timothy; VanDerslice, Jer ...; Mohrmann, Joel; Woollam, John A.; Schubert, Eva; visa fler...; Schubert, Mathia ...; visa färre...

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