Substantial difference in target surface chemistry between reactive dc and high power impulse magnetron sputtering

Greczynski, GrzegorzLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,Rhein Westfal TH Aachen, Germany (author)

Funding Agencies|German Research Foundation (DFG) [SFB-TR 87]; Knut and Alice Wallenberg Foundation Scholar [KAW2016.0358]; VINN Excellence Center Functional Nanoscale Materials (FunMat-2) [2016-05156]; Aforsk Foundation [16-359]; Carl Tryggers Stiftelse [CTS 15:219, CTS 14:431]
The nitride layer formed in the target race track during the deposition of stoichiometric TiN thin films is a factor 2.5 thicker for high power impulse magnetron sputtering (HIPIMS), compared to conventional dc processing (DCMS). The phenomenon is explained using x-ray photoelectron spectroscopy analysis of the as-operated Ti target surface chemistry supported by sputter depth profiles, dynamic Monte Carlo simulations employing the TRIDYN code, and plasma chemical investigations by ion mass spectrometry. The target chemistry and the thickness of the nitride layer are found to be determined by the implantation of nitrogen ions, predominantly N+ and N-2(+) for HIPIMS and DCMS, respectively. Knowledge of this method-inherent difference enables robust processing of high quality functional coatings.

NATURVETENSKAP Kemi Oorganisk kemi hsv//swe
NATURAL SCIENCES Chemical Sciences Inorganic Chemistry hsv//eng
HIPIMS; HPPMS; TiN; XPS; magnetron sputtering; target poisoning; target chemistry

Mraz, S.Rhein Westfal TH Aachen, Germany (author)
Schneider, J. M.Rhein Westfal TH Aachen, Germany (author)
Hultman, LarsLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)larhu75 (author)
Linköpings universitetTunnfilmsfysik (creator_code:org_t)

By the author/editor: Greczynski, Grze ...; Mraz, S.; Schneider, J. M.; Hultman, Lars

About the subject

NATURAL SCIENCES: NATURAL SCIENCES; and Chemical Science ...; and Inorganic Chemis ...

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