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Silicon carbonitrid...
Silicon carbonitride thin films deposited by reactive high power impulse magnetron sputtering
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- Hänninen, Tuomas, 1988- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Schmidt, Susann, 1981- (författare)
- IHI Ionbond AG, Industriestraße 211, Olten CH-4600, Switzerland
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- Ivanov, Ivan Gueorguiev, 1955- (författare)
- Linköpings universitet,Halvledarmaterial,Tekniska fakulteten
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visa fler...
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- Jensen, Jens, 1968- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Hultman, Lars, Professor, 1960- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Högberg, Hans, 1968- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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visa färre...
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(creator_code:org_t)
- Elsevier, 2018
- 2018
- Engelska.
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Ingår i: Surface & Coatings Technology. - : Elsevier. - 0257-8972 .- 1879-3347. ; 335, s. 248-256
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Amorphous silicon carbonitride thin films for biomedical applications were deposited in an industrial coating unit from a silicon target in different argon/nitrogen/acetylene mixtures by reactive high power impulse magnetron sputtering (rHiPIMS). The effects of acetylene (C2H2) flow rate, substrate temperature, substrate bias voltage, and HiPIMS pulse frequency on the film properties were investigated. Low C2H2 flow rates (<10 sccm) resulted in silicon nitride-like film properties, seen from a dense morphology when viewed in cross-sectional scanning electron microscopy, a hardness up to ∼22 GPa as measured by nanoindentation, and Si-N bonds dominating over Si-C bonds in X-ray photoelectron spectroscopy core-level spectra. Higher C2H2 flows resulted in increasingly amorphous carbon-like film properties, with a granular appearance of the film morphology, mass densities below 2 g/cm3 as measured by X-ray reflectivity, and a hardness down to 4.5 GPa. Increasing substrate temperatures and bias voltages resulted in slightly higher film hardnesses and higher compressive residual stresses. The film H/E ratio showed a maximum at film carbon contents ranging between 15 and 30 at.% and at elevated substrate temperatures from 340 °C to 520 °C.
Ämnesord
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Nyckelord
- Magnetron sputtering
- Silicon carbonitride
- Acetylene
- Hardness
- H/E
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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Till lärosätets databas
- Av författaren/redakt...
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Hänninen, Tuomas ...
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Schmidt, Susann, ...
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Ivanov, Ivan Gue ...
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Jensen, Jens, 19 ...
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Hultman, Lars, P ...
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Högberg, Hans, 1 ...
- Om ämnet
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- NATURVETENSKAP
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NATURVETENSKAP
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Surface & Coatin ...
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Linköpings universitet