An investigation on microstructure and milling performance of arc-evaporated TiSin/AlTiN film

• In this work, TiSiN/AlTiN multilayer film was deposited on cemented-carbide solid end mill tools by cathodic arc evaporation. The multilayer consisted of CrN buffer layer, Al(0.6)7Ti(0.33)N adhesion layer, Ti0.9Si0.1N/Al(0.6)7Ti(0.33)N alternate layer, and Ti0.9Si0.1N outlayer. An investigation on microstructure, mechanical properties, high-temperature wear rate, and milling performance of TiSiN/AlTiN multilayer film was conducted. The results indicate that the as-deposited TiSiN/AlTiN film exhibits a mixture phase of fcc-TiN and fcc-(Ti, Al)N. The hardness and elastic modulus of the TiSiN/AlTiN film are 41.7 +/- 1.6 GPa and 340 +/- 17 GPa, respectively. The wear rate of TiSiN/AlTiN film changes slightly when the experiment temperature is below 400 degrees C, and then increases with the temperature increases to 600 degrees C. Indentation hardness of TiSiN/AlTiN changes can be maintained above 40 GPa upon annealing to 800 degrees C. However, the hardness of the film decreases from above 40 GPa to similar to 30.6 GPa when the annealing temperature increases to 1000 degrees C. During dry milling, the TiSiN/AlTiN film reduces the adhesion between the coated tool and machined material SKD 11, leading to a low cutting force and cutting temperature.

Ämnesord

NATURVETENSKAP  -- Kemi -- Oorganisk kemi (hsv//swe)

NATURAL SCIENCES  -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)

Nyckelord

Titanium silicon nitride; Cathodic-arc evaporation; Annealing; Hardness; Wear resistance; Milling performance

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