Sökning: WFRF:(Ivanov Ivan Gueorguiev) >
Nanoscale phenomena...
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Kakanakova-Gueorguieva, AneliaLinköpings universitet,Halvledarmaterial,Tekniska fakulteten
(författare)
Nanoscale phenomena ruling deposition and intercalation of AlN at the graphene/SiC interface
- Artikel/kapitelEngelska2020
Förlag, utgivningsår, omfång ...
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2020
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ROYAL SOC CHEMISTRY,2020
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electronicrdacarrier
Nummerbeteckningar
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LIBRIS-ID:oai:DiVA.org:liu-170933
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https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-170933URI
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https://doi.org/10.1039/d0nr04464dDOI
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Språk:engelska
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Sammanfattning på:engelska
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Klassifikation
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Ämneskategori:ref swepub-contenttype
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Ämneskategori:art swepub-publicationtype
Anmärkningar
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Funding Agencies|FLAG-ERA 2015 JTC project GRIFONE through Swedish Research Council [VR 2015-06816]; National Research Development and Innovation Office, Hungary NN [118914]; Italian Ministry of Education and Research (MIUR) under project Beyond-NanoMinistry of Education, Universities and Research (MIUR) [PON a3_00363, VR 2017-04071, AF15-557, KAW 2013.0049, AF18-266]; Swedish Research CouncilSwedish Research Council [SNIC 2020/5-146, SNIC 2020/14-17, 2018-05973]; Italian Ministry of Education and Research (MIUR) under the project EleGaNTeMinistry of Education, Universities and Research (MIUR) [PON ARS01_01007]; European Structural and Investment Funds [VEKOP-2.3.3-15-2016-00002]; [VR 2016-05362]
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The possibility for kinetic stabilization of prospective 2D AlN was explored by rationalizing metal organic chemical vapor deposition (MOCVD) processes of AlN on epitaxial graphene. From the wide range of temperatures which can be covered in the same MOCVD reactor, the deposition was performed at the selected temperatures of 700, 900, and 1240 degrees C. The characterization of the structures by atomic force microscopy, electron microscopy and Raman spectroscopy revealed a broad range of surface nucleation and intercalation phenomena. These phenomena included the abundant formation of nucleation sites on graphene, the fragmentation of the graphene layers which accelerated with the deposition temperature, the delivery of excess precursor-derived carbon adatoms to the surface, as well as intercalation of sub-layers of aluminum atoms at the graphene/SiC interface. The conceptual understanding of these nanoscale phenomena was supported by our previous comprehensiveab initiomolecular dynamics (AIMD) simulations of the surface reaction of trimethylaluminum, (CH3)(3)Al, precursor with graphene. A case of applying trimethylindium, (CH3)(3)In, precursor to epitaxial graphene was considered in a comparative way.
Ämnesord och genrebeteckningar
Biuppslag (personer, institutioner, konferenser, titlar ...)
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Gueorguiev, Gueorgui KostovLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)guegu96
(författare)
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Sangiovanni, DavideLinköpings universitet,Teoretisk Fysik,Tekniska fakulteten(Swepub:liu)davsa82
(författare)
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Suwannaharn, NattamonLinköpings universitet,Halvledarmaterial,Tekniska fakulteten,Chulalongkorn Univ, Thailand(Swepub:liu)natsu01
(författare)
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Ivanov, Ivan GueorguievLinköpings universitet,Halvledarmaterial,Tekniska fakulteten(Swepub:liu)ivaiv28
(författare)
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Cora, IldikoCtr Energy Res, Hungary
(författare)
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Pecz, BelaCtr Energy Res, Hungary
(författare)
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Nicotra, GiuseppeIst Microelettron & Microsistemi, Italy
(författare)
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Giannazzo, FilippoIst Microelettron & Microsistemi, Italy
(författare)
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Linköpings universitetHalvledarmaterial
(creator_code:org_t)
Sammanhörande titlar
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Ingår i:Nanoscale: ROYAL SOC CHEMISTRY12:37, s. 19470-194762040-33642040-3372
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