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- Höglund, Carina,1981-Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan (author)
Topotaxial growth of Ti2AlN by solid state reaction in AlN/Ti(0001) multilayer thin films
- Article/chapterEnglish2007
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- AIP Publishing,2007
- printrdacarrier
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- LIBRIS-ID:oai:DiVA.org:liu-17105
- https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-17105URI
- https://doi.org/10.1063/1.2731520DOI
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- Language:English
- Summary in:English
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- The formation of Ti2AlN by solid state reaction between layers of wurtzite-AlN and α-Ti was characterized by in situ x-ray scattering. The sequential deposition of these layers by dual magnetron sputtering onto Al2O3(0001) at 200 °C yielded smooth, heteroepitaxial (0001) oriented films, with abrupt AlN/Ti interfaces as shown by x-ray reflectivity and Rutherford backscattering spectroscopy. Annealing at 400 °C led to AlN decomposition and diffusion of released Al and N into the Ti layers, with formation of Ti3AlN. Further annealing at 500 °C resulted in a phase transformation into Ti2AlN(0001) after only 5 min.
Subject headings and genre
- NATURAL SCIENCES
- NATURVETENSKAP
Added entries (persons, corporate bodies, meetings, titles ...)
- Beckers, ManfredLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)manbe01 (author)
- Schell, NorbertGKSS Research Center Geesthacht (author)
- Borany, J.v.Institute of Ion Beam Physics and Materials Research, Forschungszentrum Dresen-Rossendorf (author)
- Birch, JensLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)jenbi91 (author)
- Hultman, LarsLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)larhu75 (author)
- Linköpings universitetTunnfilmsfysik (creator_code:org_t)
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- In:Applied Physics Letters: AIP Publishing90:1741060003-69511077-3118
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