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Reactive sputtering...
Reactive sputtering of CSx thin solid films using CS2 as precursor
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- Högberg, Hans (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Lai, Chung-Chuan (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,European Spallat Source ERIC, Sweden
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- Broitman, Esteban (author)
- Linköpings universitet,Institutionen för fysik, kemi och biologi,Tekniska fakulteten
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- Ivanov, Ivan Gueorguiev (author)
- Linköpings universitet,Halvledarmaterial,Tekniska fakulteten
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- Goyenola, Cecilia (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Näslund, Lars-Åke (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Schmidt, Susann (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,IHI Ionbond AG, Switzerland
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- Hultman, Lars (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Rosén, Johanna (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Gueorguiev, Gueorgui Kostov (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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(creator_code:org_t)
- PERGAMON-ELSEVIER SCIENCE LTD, 2020
- 2020
- English.
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In: Vacuum. - : PERGAMON-ELSEVIER SCIENCE LTD. - 0042-207X .- 1879-2715. ; 182
- Related links:
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https://liu.diva-por... (primary) (Raw object)
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https://doi.org/10.1...
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
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- We deposit CSx thin solid films by reactive direct current magnetron sputtering of a C target in an argon plasma, using carbon disulfide (CS2) as a precursor to film growth. We investigate the influence of the partial pressure of the CS2 vapor introduced into the plasma on the composition, the chemical bonding structure, the structural, and the mechanical properties as determined by x-ray photoelectron spectroscopy (XPS), Raman spectroscopy, scanning electron microscopy (SEM), and nanoindentation for films deposited at 150 and 300 degrees C. The Raman and the XPS results indicate that S atoms are incorporated in mostly sp(2) bonded C network. These results agree with previous ab-initio theoretical findings obtained by modeling of the CSx compound by the Synthetic Growth Concept. The microstructure of the films as well as the results of their Raman characterization and the nano mechanical testing results all point out that with the increasing S content some spa bonding is admixed in the predominantly sp(2) bonded CSx network, leading to typical amorphous structure with short and interlocked graphene-like planes for S contents between 2% and 8%. We conclude that CSx thin solid films deposited by using CS2 as a precursor would be CSx films deposited at low temperature of similar to 150 degrees C and with an S content in the region of 6 at.% may be interesting candidates for applications as hard/elastic protective coatings.
Subject headings
- NATURVETENSKAP -- Kemi -- Oorganisk kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)
Keyword
- Carbon-based nanostructured materials; Protective and hard coatings; Reactive direct current magnetron sputtering; Thin film characterization
Publication and Content Type
- ref (subject category)
- art (subject category)
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Vacuum
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- By the author/editor
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Högberg, Hans
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Lai, Chung-Chuan
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Broitman, Esteba ...
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Ivanov, Ivan Gue ...
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Goyenola, Cecili ...
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Näslund, Lars-Åk ...
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show more...
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Schmidt, Susann
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Hultman, Lars
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Rosén, Johanna
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Gueorguiev, Gueo ...
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- About the subject
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Chemical Science ...
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and Inorganic Chemis ...
- Articles in the publication
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Vacuum
- By the university
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Linköping University