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A model to predict image formation in the three-dimensional field ion microscope?

Klaes, Benjamin (author)
Normandie Univ, France
Larde, Rodrigue (author)
Normandie Univ, France
Delaroche, Fabien (author)
Normandie Univ, France
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Parviainen, Stefan (author)
Normandie Univ, France
Rolland, Nicolas (author)
Linköpings universitet,Laboratoriet för organisk elektronik,Tekniska fakulteten
Katnagallu, Shyam (author)
Max Planck Inst Eisenforsch GmbH, Germany
Gault, Baptiste (author)
Max Planck Inst Eisenforsch GmbH, Germany; Imperial Coll London, England
Vurpillot, Francois (author)
Normandie Univ, France; Max Planck Inst Eisenforsch GmbH, Germany
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 (creator_code:org_t)
ELSEVIER, 2021
2021
English.
In: Computer Physics Communications. - : ELSEVIER. - 0010-4655 .- 1879-2944. ; 260
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • Field ion microscopy (FIM) was the first technique to image individual atoms on the surface of a material. By a careful control of the field evaporation of surface atoms, the bulk of the material is exposed, and, through digital processing of a sequence of micrographs, an atomically-resolved threedimensional reconstruction can be achieved. 3DFIM is particularly suited to the direct observation of crystalline defects that underpin the physical properties of materials: vacancies and vacancy clusters, interstitials, dislocations, or grain boundaries. Yet, further developments of 3DFIM are necessary to turn it into a routines technique. Here, we introduce first a protocol for 3DFIM image processing and subsequent tomographic reconstruction. Second, we propose a numerical model enabling simulation of the FIM imaging process. The model combines the meshless algorithm for field evaporation proposed by Rolland et al. (Robin-Rolland Model, or RRM) with fundamental aspects of the field ionization process of the gas image involved in FIM. The proposed model enables the simulation of imaging artefacts that are induced by non-regular field evaporation and by the disturbed electric field distribution near atomic defects. Our model enables more precise interpretation of 3DFIM characterization of structural defects. (C) 2020 Elsevier B.V. All rights reserved.

Subject headings

NATURVETENSKAP  -- Fysik -- Atom- och molekylfysik och optik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences -- Atom and Molecular Physics and Optics (hsv//eng)

Keyword

Field ion microscopy; Simulation; Tomography; Field evaporation; Field ionization

Publication and Content Type

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