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Target ion and neut...
Target ion and neutral spread in high power impulse magnetron sputtering
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- Hajihoseini, H. (författare)
- Univ Twente, MESA Inst Nanotechnol, Ind Focus Grp XUV Opt, Drienerlolaan 5, NL-7522 NB Enschede, Netherlands.
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- Brenning, Nils (författare)
- KTH,Rymd- och plasmafysik,KTH Royal Inst Technol, Sweden
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- Rudolph, M. (författare)
- Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany.
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- Raadu, Michael A. (författare)
- KTH,Rymd- och plasmafysik,KTH Royal Inst Technol, Sweden
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- Lundin, Daniel (författare)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten
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- Fischer, Joel (författare)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten
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- Minea, T. M. (författare)
- Univ Paris Saclay, Univ Paris Sud, Lab Phys Gaz & Plasmas LPGP, UMR 8578 CNRS, F-91405 Orsay, France.
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- Gudmundsson, Jon Tomas, 1965- (författare)
- KTH,Rymd- och plasmafysik,Univ Iceland, Sci Inst, Dunhaga 3, IS-107 Reykjavik, Iceland.,KTH Royal Inst Technol, Sweden; Univ Iceland, Iceland
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Univ Twente, MESA Inst Nanotechnol, Ind Focus Grp XUV Opt, Drienerlolaan 5, NL-7522 NB Enschede, Netherlands Rymd- och plasmafysik (creator_code:org_t)
- American Vacuum Society, 2023
- 2023
- Engelska.
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Ingår i: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : American Vacuum Society. - 0734-2101 .- 1520-8559. ; 41:1
- Relaterad länk:
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https://doi.org/10.1...
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https://liu.diva-por... (primary) (Raw object)
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- In magnetron sputtering, only a fraction of the sputtered target material leaving the ionization region is directed toward the substrate. This fraction may be different for ions and neutrals of the target material as the neutrals and ions can exhibit a different spread as they travel from the target surface toward the substrate. This difference can be significant in high power impulse magnetron sputtering (HiPIMS) where a substantial fraction of the sputtered material is known to be ionized. Geometrical factors or transport parameters that account for the loss of produced film-forming species to the chamber walls are needed for experimental characterization and modeling of the magnetron sputtering discharge. Here, we experimentally determine transport parameters for ions and neutral atoms in a HiPIMS discharge with a titanium target for various magnet configurations. Transport parameters are determined to a typical substrate, with the same diameter (100 mm) as the cathode target, and located at a distance 70 mm from the target surface. As the magnet configuration and/or the discharge current are changed, the transport parameter for neutral atoms xi(tn) remains roughly the same, while transport parameters for ions xi(ti) vary greatly. Furthermore, the relative ion-to-neutral transport factors, xi(ti)/xi(tn), that describe the relative deposited fractions of target material ions and neutrals onto the substrate, are determined to be in the range from 0.4 to 1.1.
Ämnesord
- NATURVETENSKAP -- Fysik -- Fusion, plasma och rymdfysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Fusion, Plasma and Space Physics (hsv//eng)
- NATURVETENSKAP -- Kemi -- Oorganisk kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)
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