Evolution of microstructure and properties of TiNbCrAlHfN films grown by unipolar and bipolar high-power impulse magnetron co-sputtering: The role of growth temperature and ion bombardment

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Du, HaoLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten,Guizhou Univ, Peoples R China; Guizhou Univ, Peoples R China (author)

Evolution of microstructure and properties of TiNbCrAlHfN films grown by unipolar and bipolar high-power impulse magnetron co-sputtering: The role of growth temperature and ion bombardment

Article/chapterEnglish2023

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ELSEVIER SCIENCE SA,2023
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LIBRIS-ID:oai:DiVA.org:liu-193022
https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-193022URI
https://doi.org/10.1016/j.surfcoat.2023.129389DOI

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Language:English
Summary in:English

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Funding Agencies|VINNOVA Competence Centre FunMat-II; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [2016-05156]; Knut and Alice Wallenberg Foundation through the Wallenberg Academy Fellows program [2009 00971]; Swedish Research Council [KAW-2020.0196]; Eurostars program [VR 2021-03826, VR 2018-04139]; National Natural Science Foundation of China [52165021]; Science and Technology Foundation of Guizhou Province [51805102, [2020]1Y228]; Swedish Research Council VR-RFI [2019-00191]; Swedish Foundation for Strategic Research [RIF14-0053]; [E!114277]
Growth temperature (Ts) and ion irradiation energy (Ei) are important factors that influence film growth as well as their properties. In this study, we investigate the evolution of crystal structure and residual stress of TiNb-CrAlHfN films under various Ts and Ei conditions, where the latter is mainly controlled by tuning the flux of sputtered Hf ions using bipolar high-power impulse magnetron (BP-HiPIMS). The results show that TiNbCrAlHfN films exhibit the typical FCC NaCl-type structure. By increasing Ts from room temperature to 600 degrees C, the film texture changes from high-surface-energy (111) to low-surface-energy (100) accompanied by a higher crystal-linity in the out-of-plane direction and a more disordered growth tilt angle to the surface plane. In addition, compressive stress decreases with increasing Ts, which is ascribed to changes in the film growth both in the early and post-coalescence stages and more tensile thermal stress at elevated Ts. In contrast, a clear texture transition window is seen under various Ei of Hf+ ions, i.e., high-surface-energy planes change to low-surface-energy planes as Ei exceeds-110 eV, while low-surface-energy planes gradually transform back to high-surface-energy planes when Ei increases from 210 to 260 eV, indicating renucleation events for Ei > 210 eV. Compressive stress in-creases with increasing Ei but is still lower than that of a reference series with DC substrate bias UDC =-100 V. The study shows that it is possible to tailor properties of FCC-structured high-entropy nitrides by varying Ts and Ei in a similar fashion to conventional transition metal nitrides using the approach of unipolar and bipolar HiPIMS co-sputtering.

Subject headings and genre

NATURVETENSKAP Kemi Oorganisk kemi hsv//swe
NATURAL SCIENCES Chemical Sciences Inorganic Chemistry hsv//eng
Multicomponent; Bipolar HiPIMS; Ion bombardment; Residual stress; Texture

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Shu, RuiLinköpings universitet,Laboratoriet för organisk elektronik,Tekniska fakulteten(Swepub:liu)ruish16 (author)
Boyd, RobertLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)robbo87 (author)
Le Febvrier, ArnaudLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)arnle40 (author)
Helmersson, UlfLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)ulfhe30 (author)
Eklund, PerLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)perek02 (author)
Lundin, DanielLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)danlu03 (author)
Linköpings universitetPlasma och ytbeläggningsfysik (creator_code:org_t)

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In:Surface & Coatings Technology: ELSEVIER SCIENCE SA4590257-89721879-3347

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By the author/editor: Du, Hao; Shu, Rui; Boyd, Robert; Le Febvrier, Arn ...; Helmersson, Ulf; Eklund, Per; show more...; Lundin, Daniel; show less...

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By the university: Linköping University

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