Study on different isolation technology on the performance of blue micro-LEDs array applications

Funding Agencies|National Science and Technoloy Concil, Taiwan
In this study, a 3 x 3 blue micro-LED array with a pixel size of 10 x 10 mu m2 and a pitch of 15 mu m was fabricated on an epilayer grown on a sapphire substrate using metalorganic chemical vapor deposition technology. The fabrication process involved photolithography, wet and dry etching, E-beam evaporation, and ion implantation technology. Arsenic multi-energy implantation was utilized to replace the mesa etching for electrical isolation, where the implantation depth increased with the average energy. Different ion depth profiles had varying effects on electrical properties, such as forward current and leakage currents, potentially causing damage to the n-GaN layer and increasing the series resistance of the LEDs. As the implantation depth increased, the light output power and peak external quantum efficiency of the LEDs also increased, improving from 5.33 to 9.82%. However, the efficiency droop also increased from 46.3 to 48.6%.

Lo, Yu-YunNatl Yang Ming Chiao Tung Univ, Taiwan (författare)
Hsu, Yu-HsuanNatl Yang Ming Chiao Tung Univ, Taiwan (författare)
Lin, Chien-ChungNatl Taiwan Univ, Taiwan (författare)
Zan, Hsiao-WenNatl Yang Ming Chiao Tung Univ, Taiwan (författare)
Lin, Yi-HsinNatl Yang Ming Chiao Tung Univ, Taiwan (författare)
Wuu, Dong-SingNatl Chi Nan Univ, Taiwan (författare)
Hsiao, Ching-LienLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)chihs76 (författare)
Horng, Ray-HuaNatl Yang Ming Chiao Tung Univ, Taiwan (författare)
Natl Yang Ming Chiao Tung Univ, TaiwanNatl Taiwan Univ, Taiwan (creator_code:org_t)

Av författaren/redakt...: Lin, Shao-Hua; Lo, Yu-Yun; Hsu, Yu-Hsuan; Lin, Chien-Chung; Zan, Hsiao-Wen; Lin, Yi-Hsin; visa fler...; Wuu, Dong-Sing; Hsiao, Ching-Lie ...; Horng, Ray-Hua; visa färre...

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