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Surface morphology, structural and optical properties of polar and non-polar ZnO thin films : A comparative study

Deng, R. (author)
Jilin University
Yao, B. (author)
Jilin University
Li, Y.F. (author)
Changchun Institute of Optics
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Li, B.H. (author)
Changchun Institute of Optics
Zhang, Z.Z. (author)
Changchun Institute of Optics
Zhao, H.F. (author)
Changchun Institute of Optics
Zhang, J.Y. (author)
Changchun Institute of Optics
Zhao, D.X. (author)
Changchun Institute of Optics
Shen, D.Z. (author)
Changchun Institute of Optics
Fan, X.W. (author)
Changchun Institute of Optics
Yang, Li Li (author)
Linköpings universitet,Institutionen för teknik och naturvetenskap,Tekniska högskolan
Zhao, Qingxiang (author)
Linköpings universitet,Institutionen för teknik och naturvetenskap,Tekniska högskolan
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 (creator_code:org_t)
Elsevier BV, 2009
2009
English.
In: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248. ; 311:19, s. 4398-4401
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • The polar and non-polar ZnO thin films were fabricated on cubic MgO (1 1 1) and (0 0 1) substrates by plasma-assisted molecular beam epitaxy. Based on X-ray diffraction analysis, the ZnO thin films grown on MgO (1 1 1) and (1 0 0) substrates exhibit the polar c-plane and non-polar m-plane orientation, respectively. Comparing with the c-plane ZnO film, the non-polar m-plane ZnO film shows cross-hatched stripes-like morphology, lower surface roughness and slower growth rate. However, low-temperature photoluminescence measurement indicates the m-plane ZnO film has a stronger 3.31 eV emission, which is considered to be related to stacking faults. Meanwhile, stronger band tails absorbance of the m-plane ZnO film is observed in optical absorption spectrum.

Keyword

A1. Atomic force microscopy; A1. X-ray diffraction; A3. Molecular beam epitaxy; Al. Photoluminescence; B1. Zinc oxide
TECHNOLOGY
TEKNIKVETENSKAP

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art (subject category)

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