Deep levels and carrier compensation in V-doped semi-insulating 4H-SiC

• Electron paramagnetic resonance was used to study semi-insulating (SI) 4H-SiC substrates doped with vanadium (V) in the range of 5.5× 1015 -1.1× 1017 cm-3. Our results show that the electrical activation of V is low and hence only in heavily V-doped 4H-SiC, vanadium is responsible for the SI behavior, whereas in moderately V-doped substrates, the SI properties are thermally unstable and determined by intrinsic defects. We show that the commonly observed thermal activation energy Ea ∼1.1 eV in V-doped 4H-SiC may be related to deep levels of the carbon vacancy. © 2007 American Institute of Physics.

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