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  • Schifano, R. (author)

Electrical and optical characterization of 4H-SiC diodes for particle detection

  • Article/chapterEnglish2005

Publisher, publication year, extent ...

  • AIP Publishing,2005
  • printrdacarrier

Numbers

  • LIBRIS-ID:oai:DiVA.org:liu-45444
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-45444URI
  • https://doi.org/10.1063/1.1906294DOI

Supplementary language notes

  • Language:English
  • Summary in:English

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Classification

  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • The electronic and optical properties of several (medium to high quality) 4H-SiC epitaxial sensors for particle detection have been studied. The samples are n -doped Schottky diodes with different nitrogen concentrations (6× 1013 cm-3 -5× 1015 cm-3) and thicknesses (20-40 µm). A full electrical and optical characterization has been performed by capacitance versus voltage measurements and near-band-edge low-temperature photoluminescence. The effective doping along the epilayer and the depletion width have been determined and data are consistent with the charge collection efficiency characterization performed with a minimum ionizing ? -source. All the investigated samples exhibit a 100% collection efficiency. In particular, the best samples yield a highly reproducible signal, well separated from the pedestal. Photoluminescence results show a linear relationship between the effective doping and the ratio of nitrogen-bound excitonic emission (Q0) and free excitonic line (I76), in agreement with a previous work on 4H-SiC with a higher doping concentration [I. G. Ivanov, C. Hallin, A. Henry, O. Kordina, and E. Janzn, J. Appl. Phys. 80, 3504 (1996)]. Moreover we show that the dependence of the major spectral features as a function of the penetration depth of the exciting laser beam can quantitatively provide information on substrate contribution to the photoluminescence. In conclusion, we bring evidence that a detailed characterization of SiC-based detectors, by all optical techniques, yields an accurate value for the net doping and gives a qualitative information on the epilayer thickness prior to any electrical wafer tests. © 2005 American Institute of Physics.

Subject headings and genre

  • TECHNOLOGY
  • TEKNIKVETENSKAP

Added entries (persons, corporate bodies, meetings, titles ...)

  • Vinattieri, A.Department of Physics, University of Florence, Via Sansone 1, I-50019 Sesto Fiorentino, Italy (author)
  • Bruzzi, M.Department of Energetics, Istituto Nazionale di Física Nucleare (INFN), University of Florence, Via di Santa Marta 3, I-50139 Florence, Italy (author)
  • Miglio, S.Department of Energetics, Istituto Nazionale di Física Nucleare (INFN), University of Florence, Via di Santa Marta 3, I-50139 Florence, Italy (author)
  • Lagomarsino, S.Department of Energetics, Istituto Nazionale di Física Nucleare (INFN), University of Florence, Via di Santa Marta 3, I-50139 Florence, Italy (author)
  • Sciortino, S.Department of Energetics, Istituto Nazionale di Física Nucleare (INFN), University of Florence, Via di Santa Marta 3, I-50139 Florence, Italy (author)
  • Nava, F.Department of Physics, University of Modena, Via Campi 213A, I-41100 Modena, Italy (author)
  • Department of Physics, University of Florence, Via Sansone 1, I-50019 Sesto Fiorentino, ItalyDepartment of Energetics, Istituto Nazionale di Física Nucleare (INFN), University of Florence, Via di Santa Marta 3, I-50139 Florence, Italy (creator_code:org_t)

Related titles

  • In:Journal of Applied Physics: AIP Publishing97:10, s. 103539-0021-89791089-7550

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