Scanning spreading resistance microscopy of aluminum implanted 4H-SiC

Osterman, J.Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden (author)

QC 20100525
Results from the application of scanning spreading resistance microscopy (SSRM) for characterization of aluminum implanted 4H-SiC are presented. The implanted profiles are investigated electrically and morphologically as a function of post-implantation anneal conditions. The method is shown to be advantageous for measuring and optimizing the activation in many aspects with respect to existing alternative techniques: it provides information of the entire depth and Al concentration range, it is unaffected by annealing induced re-growth and/or surface roughening, and requires little sample preparation. The results indicate that the apparent activation and surface roughness do not saturate in the investigated temperature range of 1500-1650 °C. Finally, an apparent activation energy for the process of 3 eV is estimated. © 2003 Elsevier B.V. All rights reserved.

Abtin, L.Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden (author)
Zimmermann, U.Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden (author)
Janson, M.S.Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden (author)
Anand, SrinivasanKTH,Mikroelektronik och informationsteknik, IMIT,Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden(Swepub:kth)u16fqvka (author)
Hallin, ChristerLinköpings universitet,Tekniska högskolan,Institutionen för fysik, kemi och biologi(Swepub:liu)chrha60 (author)
Hallén, AndersKTH,Mikroelektronik och informationsteknik, IMIT,Hallén, A., Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden(Swepub:kth)u11ywmz1 (author)
Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, SwedenMikroelektronik och informationsteknik, IMIT (creator_code:org_t)

By the author/editor: Osterman, J.; Abtin, L.; Zimmermann, U.; Janson, M.S.; Anand, Srinivasa ...; Hallin, Christer; show more...; Hallén, Anders; show less...

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.