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  • Konofaos, N.Department of Physics, University of Ioannina, P.O. Box 1186, 451 10 Ioannina, Greece (author)

Electrical characterisation of SrTiO3/Si interfaces

  • Article/chapterEnglish2002

Publisher, publication year, extent ...

  • 2002
  • printrdacarrier

Numbers

  • LIBRIS-ID:oai:DiVA.org:liu-47021
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-47021URI
  • https://doi.org/10.1016/S0022-3093(02)00983-3DOI

Supplementary language notes

  • Language:English
  • Summary in:English

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  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • Deposition of SrTiO3 (STO) thin films by ultra-high vacuum rf magnetron sputtering was performed in order to produce high-quality STO/p-Si (1 0 0) interfaces and STO insulator layers with high dielectric constants. The deposition temperatures were in the range from room temperature to 550 °C. Capacitance-voltage (C-V) and conductance-frequency measurements showed that the dielectric constant of the films ranges from 55 to 120. C-V measurements on Al/STO/p-Si structures clearly revealed the creation of metal-insulator-semiconductor diodes. The interface state densities (Dit) at the STO/p-Si interfaces were obtained from admittance spectroscopy measurements. The samples deposited at lower temperatures revealed values of Dit between 2 × 1011 and 3.5 × 1012 eV-1 cm-2 while the higher temperature deposited samples had a higher Dit ranging between 1 × 1011 and 1 × 1013 eV-1 cm-2. The above results were also well correlated to X-ray diffraction measurements, Rutherford backscattering spectroscopy, and spectroscopic ellipsometry. © 2002 Elsevier Science Ltd. All rights reserved.

Subject headings and genre

  • TECHNOLOGY
  • TEKNIKVETENSKAP

Added entries (persons, corporate bodies, meetings, titles ...)

  • Evangelou, E.K.Department of Physics, University of Ioannina, P.O. Box 1186, 451 10 Ioannina, Greece (author)
  • Wang, Z. (author)
  • Kugler, Veronika MozhdehLinköpings universitet,Tekniska högskolan,Institutionen för fysik, kemi och biologi(Swepub:liu)verku81 (author)
  • Helmersson, UlfLinköpings universitet,Tekniska högskolan,Plasma och ytbeläggningsfysik(Swepub:liu)ulfhe30 (author)
  • Department of Physics, University of Ioannina, P.O. Box 1186, 451 10 Ioannina, GreeceTekniska högskolan (creator_code:org_t)

Related titles

  • In:Journal of Non-Crystalline Solids303:1, s. 185-1890022-30931873-4812

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