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Electrical and optical properties of sputter deposited tin doped indium oxide thin films with silver additive
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- Hultaker, A. (författare)
- Hultåker, A., Department of Materials Science, The Ångström Laboratory, Uppsala University, P.O. Box 534, SE-751 21 Uppsala, Sweden
- Jarrendahl, K. (författare)
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- Lu, J. (författare)
- Department of Materials Science, The Ångström Laboratory, Uppsala University, P.O. Box 534, SE-751 21 Uppsala, Sweden
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- Hultåker, A, Department of Materials Science, The Ångström Laboratory, Uppsala University, P.O. Box 534, SE-751 21 Uppsala, Sweden Department of Materials Science, The Ångström Laboratory, Uppsala University, P.O. Box 534, SE-751 21 Uppsala, Sweden (creator_code:org_t)
- 2001
- 2001
- Engelska.
- Ingår i: Thin Solid Films. - 0040-6090 .- 1879-2731. ; 392:2, s. 305-310
- Konferensbidrag (övrigt vetenskapligt/konstnärligt)
Abstract
Ämnesord
Stäng
- Tin doped indium oxide (ITO) films with a few mol% of silver were prepared by reactive DC magnetron sputtering. The purpose of adding silver is to boost conductivity. The real part of the refractive index of ITO was determined from ellipsometry data, applying a model combining a Drude and a Lorentz term. The imaginary part was calculated from the absorptance, which was derived from transmittance and reflectance data. We found that up to 6 mol% of silver additive enhanced the conductivity by as much as a factor of two for layers post-treated at 200 and 300°C in reducing gas consisting of 93% N2 and 7% H2. For samples with 1 mol% silver, which was post-treated at 100 and 200°C, we observed an increase in the luminous transmittance. The transmittance decreased with increased silver content. © 2001 Elsevier Science B.V.
Nyckelord
- Conductivity
- Dielectric function
- Ellipsometry
- Transmission electron microscopy
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- NATURVETENSKAP
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- Hultaker, A.
- Jarrendahl, K.
- Lu, J.
- Granqvist, C.-G.
- Niklasson, G.A.
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