Growth of CNx/BN: C multilayer films by magnetron sputtering

Growth of CNx/BN : C multilayer films by magnetron sputtering

Symmetric CNx/BN:C multilayer thin films, with nominal compositional modulation periods of ? = 2.5, 5, and 9 nm were deposited by unbalanced dual cathode magnetron sputtering from C (graphite) and B4C targets in an Ar/N2 (60/40) discharge. The multilayers and single-layer of the constituent CNx and BN:C compounds were grown to a total thickness of 0.5 µm onto Si(001) substrates held at 225°C and a negative floating potential of approx. 30 V (Ei = 24 eV). Layer characterizations were performed by TEM, X-ray reflectivity, RBS, and nanoindentation measurements. Results show that CN0.33 and BN:C (35, 50, and 15 at.% of B, N, and C, respectively) layers were prepared at the above conditions. It is suggested that all films exhibit a three-dimensional interlocked structure with a cylindrical texture in the film growth direction. The structure was continuous over relatively well defined and smooth CNx/BN:C interfaces. All coatings exhibit extreme elasticity with elastic recoveries as high as 85-90% (10 mN maximum load) attributed to the observed structure. However, the multilayers were stiffer and more elastic compared to that of the single-layers and thus shows promise for improved protective properties.

Hellgren, N. (författare)
Berlind, TorunLinköpings universitet,Tekniska högskolan,Tillämpad optik(Swepub:liu)torbe21 (författare)
Broitman, E. (författare)
Hultman, LarsLinköpings universitet,Tekniska högskolan,Tunnfilmsfysik(Swepub:liu)larhu75 (författare)
Sundgren, J.-E. (författare)
Linköpings universitetTekniska högskolan (creator_code:org_t)

Av författaren/redakt...: Johansson, M P; Hellgren, N.; Berlind, Torun; Broitman, E.; Hultman, Lars; Sundgren, J.-E.

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