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  • Kassamakova, LBulgarian Acad Sci, Inst Appl Phys, Plovdiv 4000, Bulgaria IMC, Ind Microelect Ctr, S-16421 Kista, Sweden Royal Inst Technol, S-10044 Stockholm, Sweden Linkoping Univ, S-58183 Linkoping, Sweden (författare)

Temperature stable Pd ohmic contacts to p-type 4H-SiC formed at low temperatures

  • Artikel/kapitelEngelska1999

Förlag, utgivningsår, omfång ...

  • 1999
  • printrdacarrier

Nummerbeteckningar

  • LIBRIS-ID:oai:DiVA.org:liu-49772
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-49772URI

Kompletterande språkuppgifter

  • Språk:engelska
  • Sammanfattning på:engelska

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Klassifikation

  • Ämneskategori:ref swepub-contenttype
  • Ämneskategori:art swepub-publicationtype

Anmärkningar

  • The formation of low resistivity Pd-based ohmic contacts to p-type 4H-SiC below 750 degrees C are reported herein, The electrical properties of the contacts were examined using I-V measurements and the transmission-line model (TLM) technique. Contact resistivity as a function of annealing was investigated over the temperature range of 600 degrees C-700 degrees C, The lowest contact resistivity (5.5 x 10(-5) Ohm cm(2)) was obtained after annealing at 700 degrees C for 5 min, Atomic force microscopy of the as-deposited Pd layer showed a root-mean square roughness of similar to 8 nm, while after annealing at 700 degrees C, agglomeration occurred, increasing the roughness to 111 nm, Auger electron spectroscopy depth profiles revealed that with annealing, interdiffusion had resulted in the formation of Pd-rich silicides. However, X-ray diffraction and Rutherford backscattering showed that the majority of the film was still (unreacted) Pd. The thermal stability and reliability of the Pd contacts were examined by aging and temperature dependence electrical tests, The contacts annealed at 700 OC were stable at prolonged heating at a constant temperature of 500 degrees C and they showed thermal stability in air at operating temperatures up to 450 degrees C, This stability was not found for contacts formed at lower temperatures of 600 degrees C or 650 degrees C.

Ämnesord och genrebeteckningar

  • ohmic contact
  • silicon carbide
  • thermal stability
  • NATURAL SCIENCES
  • NATURVETENSKAP

Biuppslag (personer, institutioner, konferenser, titlar ...)

  • Kakanakov, RDBulgarian Acad Sci, Inst Appl Phys, Plovdiv 4000, Bulgaria IMC, Ind Microelect Ctr, S-16421 Kista, Sweden Royal Inst Technol, S-10044 Stockholm, Sweden Linkoping Univ, S-58183 Linkoping, Sweden (författare)
  • Kassamakov, IVBulgarian Acad Sci, Inst Appl Phys, Plovdiv 4000, Bulgaria IMC, Ind Microelect Ctr, S-16421 Kista, Sweden Royal Inst Technol, S-10044 Stockholm, Sweden Linkoping Univ, S-58183 Linkoping, Sweden (författare)
  • Nordell, NBulgarian Acad Sci, Inst Appl Phys, Plovdiv 4000, Bulgaria IMC, Ind Microelect Ctr, S-16421 Kista, Sweden Royal Inst Technol, S-10044 Stockholm, Sweden Linkoping Univ, S-58183 Linkoping, Sweden (författare)
  • Savage, SBulgarian Acad Sci, Inst Appl Phys, Plovdiv 4000, Bulgaria IMC, Ind Microelect Ctr, S-16421 Kista, Sweden Royal Inst Technol, S-10044 Stockholm, Sweden Linkoping Univ, S-58183 Linkoping, Sweden (författare)
  • Hjorvarsson, BBulgarian Acad Sci, Inst Appl Phys, Plovdiv 4000, Bulgaria IMC, Ind Microelect Ctr, S-16421 Kista, Sweden Royal Inst Technol, S-10044 Stockholm, Sweden Linkoping Univ, S-58183 Linkoping, Sweden (författare)
  • Svedberg, EB (författare)
  • Abom, LBulgarian Acad Sci, Inst Appl Phys, Plovdiv 4000, Bulgaria IMC, Ind Microelect Ctr, S-16421 Kista, Sweden Royal Inst Technol, S-10044 Stockholm, Sweden Linkoping Univ, S-58183 Linkoping, Sweden (författare)
  • Madsen, LDBulgarian Acad Sci, Inst Appl Phys, Plovdiv 4000, Bulgaria IMC, Ind Microelect Ctr, S-16421 Kista, Sweden Royal Inst Technol, S-10044 Stockholm, Sweden Linkoping Univ, S-58183 Linkoping, Sweden (författare)
  • Bulgarian Acad Sci, Inst Appl Phys, Plovdiv 4000, Bulgaria IMC, Ind Microelect Ctr, S-16421 Kista, Sweden Royal Inst Technol, S-10044 Stockholm, Sweden Linkoping Univ, S-58183 Linkoping, Sweden (creator_code:org_t)

Sammanhörande titlar

  • Ingår i:IEEE Transactions on Electron Devices46:3, s. 605-6110018-93831557-9646

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