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Deposition and char...
Deposition and characterization of ternary thin films within the Ti-Al-C system by DC magnetron sputtering
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- Wilhelmsson, O. (author)
- Uppsala universitet,Institutionen för materialkemi,Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, P.O. Box 538, SE-751 21 Uppsala, Sweden
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- Persson, Per (author)
- Linköpings universitet,Uppsala universitet,Institutionen för materialkemi,Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, P.O. Box 538, SE-751 21 Uppsala, Sweden,Tekniska högskolan,Tunnfilmsfysik
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- Lewin, Erik (author)
- Uppsala universitet,Institutionen för materialkemi,Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, P.O. Box 538, SE-751 21 Uppsala, Sweden
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- Emmerlich, Jens (author)
- Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik
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- Eklund, Per (author)
- Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik
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- Persson, Per (author)
- Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik
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- Högberg, Hans (author)
- Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik
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Li, S. (author)
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- Ahuja, Rajeev (author)
- Uppsala universitet,Fysiska institutionen,Uppsala University, Dept. of Physics, The Ångström Laboratory, P.O. Box 530, SE-751 21 Uppsala, Sweden
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- Eriksson, O. (author)
- Uppsala universitet,Fysiska institutionen,Uppsala University, Dept. of Physics, The Ångström Laboratory, P.O. Box 530, SE-751 21 Uppsala, Sweden
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- Hultman, Lars (author)
- Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik
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- Jansson, U. (author)
- Uppsala universitet,Institutionen för materialkemi,Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, P.O. Box 538, SE-751 21 Uppsala, Sweden
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(creator_code:org_t)
- Elsevier BV, 2006
- 2006
- English.
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In: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248 .- 1873-5002. ; 291:1, s. 290-300
- Related links:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
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- The formation of ternary compounds within the Ti-Al-C system was studied by magnetron sputtering for thin-film deposition and first-principles calculations for phase stability. As-deposited films were characterized with X-ray diffraction (XRD) and high-resolution transmission electron microscopy (TEM). The hardness and Young's moduli of the material were studied by nanoindentation. Epitaxial and phase-pure films of Mn+1AXn phases Ti3AlC2 and Ti2AlC as well as the perovskite phase Ti3AlC were deposited on Al2O3(00l) wafers kept at temperatures between 800 and 900 °C. The only ternary phases observed at low temperatures (300 °C) were Ti3AlC and cubic (Ti,Al)C, the latter can be described as a metastable solid solution of Al in TiC similar to the more studied (Ti,Al)N system. The difficulties to form MAX phases at low substrate temperatures were attributed of requirement for a sufficient diffusivity to partition the elements corresponding to the relatively complex crystal structures with long c-axes. While MAX-phase synthesis at 800 °C is significantly lower than contemporary bulk sintering processes, a reduction of the substrate temperature towards 300 °C in the present thin-film deposition experiments resulted in stacking sequence variations and the intergrowth of (Ti,Al)C. © 2006 Elsevier B.V. All rights reserved.
Subject headings
- NATURVETENSKAP -- Kemi -- Oorganisk kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)
Keyword
- A1. Solid solutions
- A3. PVD
- B1. Carbides
- B1. MAX-phase
- B1. Perovksite
- TECHNOLOGY
- TEKNIKVETENSKAP
Publication and Content Type
- ref (subject category)
- art (subject category)
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- By the author/editor
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Wilhelmsson, O.
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Persson, Per
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Lewin, Erik
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Emmerlich, Jens
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Eklund, Per
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show more...
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Högberg, Hans
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Li, S.
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Ahuja, Rajeev
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Eriksson, O.
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Hultman, Lars
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Jansson, U.
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show less...
- About the subject
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Chemical Science ...
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and Inorganic Chemis ...
- Articles in the publication
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Journal of Cryst ...
- By the university
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Linköping University
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Uppsala University