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(LAR1:liu) pers:(Syväjärvi Mikael)
 

Search: (LAR1:liu) pers:(Syväjärvi Mikael) > (2010-2014) > Properties of 3C-Si...

Properties of 3C-SiC Grown by Sublimation Epitaxy on Different Type of Substrates

Beshkova, Milena (author)
Linköpings universitet,Halvledarmaterial,Tekniska högskolan
Lorenzzi, J. (author)
UMR-CNRS
Jegenyes, N. (author)
UMR-CNRS
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Birch, Jens (author)
Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
Syväjärvi, Mikael (author)
Linköpings universitet,Halvledarmaterial,Tekniska högskolan
Ferro, G. (author)
UMR-CNRS
Yakimova, Rositsa (author)
Linköpings universitet,Halvledarmaterial,Tekniska högskolan
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 (creator_code:org_t)
Transtec Publications; 1999, 2010
2010
English.
In: Materials Science Forum, Vols. 645-648. - : Transtec Publications; 1999. ; , s. 183-186
  • Conference paper (peer-reviewed)
Abstract Subject headings
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  • 3C-SiC layers have been grown by using sublimation epitaxy at a temperature of 2000 degrees C, on different types of on-axis 6H-SiC(0001) substrates. The influence of the type of substrate on the morphology of the layers investigated by Atomic Force Microscopy (AFM) is discussed. Stacking faults are studied by reciprocal space map (RSM) which shows that double positions domains exists.

Keyword

3C-SiC; Sublimation Epitaxy; morphology; AFM; HRXRD
TECHNOLOGY
TEKNIKVETENSKAP

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