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Cryogenic performan...
Cryogenic performance of ultrathin oxide MOS capacitors with in situ doped p(+) poly-Si1-xGex and poly-Si gate materials
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- Jacob, A P (författare)
- Chalmers
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- Myrberg, T (författare)
- Chalmers
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- Nour, Omer (författare)
- Chalmers
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- Willander, Magnus (författare)
- Chalmers
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- Lundgren, P (författare)
- Chalmers
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- Sveinbjörnsson, E Ö (författare)
- Chalmers
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- Ye, L L (författare)
- Chalmers
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- Thölen, A (författare)
- Chalmers
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- Caymax, M (författare)
- Interuniversity Microelectronics Centre (IMEC), Leuven, Belgium
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(creator_code:org_t)
- 2002-07-19
- 2002
- Engelska.
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Ingår i: Semiconductor Science and Technology. - : Iop Publishing Ltd. - 0268-1242 .- 1361-6641. ; 17:9, s. 942-946
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- A low-temperature electrical characterization of ultrathin oxide MOS capacitors with p(+) poly-Si1-xGex and poly-Si gate is performed. The investigated structures are suitable for future nano-scaled high speed MOSFETs. The aim of this study is to compare the low-temperature performance of poly-Si1-xGex and poly-Si gate MOS structures in the nanoscale channel length regime. Apart from the significant change in the flat band voltage, the result shows that all the poly-Si and poly-Si1-xGex gated MOS structures exhibit two centres of polarity change (zero-temperature coefficients) in capacitance. The second polarity change leads to an exclusive phenomenon in these structures. The low-temperature capacitance is found to be less than high-temperature capacitance at strong accumulation and this is in contrast to what has been observed so far in metal-gated capacitors. It is also observed that the temperature dependence of the tunnelling current is only on the oxide thickness and not on the gate material used.
Nyckelord
- TECHNOLOGY
- TEKNIKVETENSKAP
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