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- Toneva, ABulgarian Academy of Sciences, Sofia (author)
FeSi2 thin films investigated by X-ray photoelectron and infrared spectroscopy
- Article/chapterEnglish2000
Publisher, publication year, extent ...
- 2000
- printrdacarrier
Numbers
- LIBRIS-ID:oai:DiVA.org:liu-62857
- https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-62857URI
- https://doi.org/10.1016/S0042-207X(00)00200-1DOI
Supplementary language notes
- Language:English
- Summary in:English
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- SwePubSwePub
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Notes
- Thin films of iron silicide prepared by ion-beam and by electron-beam evaporation of iron on silicon substrates and following rapid thermal processing are investigated. Low-energy argon ion sputtering of surface layer is used for depth profile XPS analysis. The Si2p, Fe2p3/2, O1s and C1s electron spectra are recorded. On the basis of established binding energies and infrared transmission spectra (200–600 cm−1) conclusion are made about the effect of the annealing temperature and duration on the chemical bond type and phase composition of the iron silicide films.
Subject headings and genre
- Thin films; Iron disilicide; XPS
- NATURAL SCIENCES
- NATURVETENSKAP
Added entries (persons, corporate bodies, meetings, titles ...)
- Goranova, EBulgarian Academy of Sciences, Sofia (author)
- Beshkov, GBulgarian Academy of Sciences, Sofia (author)
- Marinova, TInstitute of General and Inorganic Chemistry, Sofia (author)
- Kakanakova-Georgieva, Anelia,1970-Institute of General and Inorganic Chemistry, Sofia(Swepub:liu)aneka59 (author)
- Bulgarian Academy of Sciences, SofiaInstitute of General and Inorganic Chemistry, Sofia (creator_code:org_t)
Related titles
- In:Vacuum58:2-3, s. 420-4270042-207X1879-2715
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- Linköping University
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