Investigation on the oxidation process of SiCO glasses by the means of non-Rutherford backscattering spectrometry

Vomiero, AlbertoIstituto Nazionale di Fisica Nucleare, Laboratori Nazionali di Legnaro, Legnaro, Italy (författare)

Upprättat; 2003; 20141217 (albvom)
Ion beam analysis was applied for the first time to characterize the oxidation process of silicon oxycarbides (SiCO) glasses (belonging to the class of polymer-derived ceramics). The technique unveiled the structure of the interface between the silica scale and the SiCO substrate. At the early oxidation stage, a smooth concentration profile was observed between the surface silica layer and the substrate. The role of the free carbon on the kinetics of the oxidation process was studied by preparing samples with different carbon content. A high amount of free C in the SiCO glasses promotes the transition, after long oxidation periods, to a sharp interface between the silica scale and the SiCO substrate. © 2003 Elsevier Science B.V. All rights reserved.

Modena, S.Dipartimento di Ingegneria dei Materiali, Università di Trento, Trento, Italy (författare)
Soraru, G. D.Dipartimento di Ingegneria dei Materiali, Università di Trento, Trento, Italy (författare)
Raj, R.Department of Mechanical Engineering, University of Colorado, Boulder, CO, USA (författare)
Blum, Y.SRI International, CA, USA (författare)
Della Mea, G.Istituto Nazionale di Fisica Nucleare, Laboratori Nazionali di Legnaro, Legnaro, Italy (författare)
Istituto Nazionale di Fisica Nucleare, Laboratori Nazionali di Legnaro, Legnaro, ItalyDipartimento di Ingegneria dei Materiali, Università di Trento, Trento, Italy (creator_code:org_t)

Ingår i:Nuclear Instruments and Methods in Physics Research Section B211:3, s. 401-4070168-583X1872-9584

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