The formation, dissociation and electrical activity of divacancy-oxygen complexes in Si

• Density functional calculations are carried out on divacancy-oxygen (V2O and V2O2) complexes in silicon, paying particular attention to their formation and dissociation mechanisms as well as their electrical activity. The formation of V2O around 220°C is controlled by the diffusion of V2 to immobile oxygen traps, while it dissociates around 300°C into VO and V. V2O and V2O2 are found to possess deep single and double acceptor levels as well as deep donor levels similar to those of V2.

Ämnesord

NATURVETENSKAP  -- Matematik -- Beräkningsmatematik (hsv//swe)

NATURAL SCIENCES  -- Mathematics -- Computational Mathematics (hsv//eng)

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Scientific Computing

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