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  • Imam, MewludeLinköping University (author)

Trimethylboron as Single-Source Precursor for Boron-Carbon Thin Film Synthesis by Plasma Chemical Vapor Deposition

  • Article/chapterEnglish2016

Publisher, publication year, extent ...

  • 2016-09-16
  • American Chemical Society (ACS),2016
  • electronicrdacarrier

Numbers

  • LIBRIS-ID:oai:DiVA.org:miun-29286
  • https://urn.kb.se/resolve?urn=urn:nbn:se:miun:diva-29286URI
  • https://doi.org/10.1021/acs.jpcc.6b06529DOI
  • https://lup.lub.lu.se/record/c5be7092-84e2-48ec-8259-ebc1db175734URI
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-132478URI

Supplementary language notes

  • Language:English
  • Summary in:English

Part of subdatabase

Classification

  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • Funding Agencies|European Spallation Source ERIC; Knut and Alice Wallenberg Foundation; BrightnESS project (Horizon) [676548]; Carl Tryggers Foundation for Scientific Research [CTS 14:431]
  • Boron carbon (BxC) thin films are potential neutron converting layers for B-10-based neutron detectors. However, as common material choices for such detectors do not tolerate temperatures above 500 degrees C, a low temperature deposition route is required. Here, we study trimethylboron B(CH3)(3) (TMB) as a single-source precursor for the deposition of BxC thin films by plasma CVD using Ar plasma. The effect of plasma power, TMB/Ar flow ratio and total pressure, on the film composition, morphology, chemical bonding, and microstructures are investigated. Dense and boron-rich films (B/C = 1.9) are achieved at high TMB flow under a low total pressure and high plasma power, which rendered an approximate substrate temperature of similar to 300 degrees C. Films mainly contain B-C bonds with the presence of B-O and C-C, which is attributed to be the origin of formed amorphous carbon in the films. The high H content 15 +/- 5 at. %) is almost independent of deposition parameters and contributed to lower the film density (2.16 g/cm(3)). The plasma compositional analysis shows that the TMB molecule decomposes to mainly atomic H, C-2, BH, and CH. A plasma chemical model for the decomposition of TMB with BH and CH as the plausible film depositing species in the plasma is proposed.

Subject headings and genre

Added entries (persons, corporate bodies, meetings, titles ...)

  • Höglund, CarinaLinköpings universitet,Linköping University,Lund University,Lunds universitet,European Spallation Source ESS AB,Stiftelser och övriga anknutna verksamheter,Other Institutions and Utilities,Tekniska fakulteten,Tunnfilmsfysik,European Spallat Source ERIC, Sweden(Swepub:liu)carho79 (author)
  • Jensen, JensLinköpings universitet,Linköping University,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)jenje80 (author)
  • Schmidt, SusannLinköpings universitet,Linköping University,Tunnfilmsfysik,Tekniska fakulteten,European Spallat Source ERIC, Sweden(Swepub:liu)sussc11 (author)
  • Ivanov, Ivan GueorguievLinköpings universitet,Linköping University,Halvledarmaterial,Tekniska fakulteten(Swepub:liu)ivaiv28 (author)
  • Hall-Wilton, Richard J.Mid Sweden University,Lund University,Lunds universitet,Mittuniversitetet,Avdelningen för elektronikkonstruktion,European Spallat Source ERIC, Lund,European Spallation Source ESS AB,Stiftelser och övriga anknutna verksamheter,Other Institutions and Utilities,European Spallat Source ERIC, Sweden; Mid Sweden University, Sweden(Swepub:lu)esss-rhl (author)
  • Birch, JensLinköpings universitet,Linköping University,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)jenbi91 (author)
  • Pedersen, HenrikLinköpings universitet,Linköping University,Kemi,Tekniska fakulteten(Swepub:liu)henpe50 (author)
  • Maiwulidan, YimamuLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,European Spallat Source ERIC, Sweden(Swepub:liu)yimma52 (author)
  • Linköping UniversityEuropean Spallation Source ESS AB (creator_code:org_t)

Related titles

  • In:The Journal of Physical Chemistry C: American Chemical Society (ACS)120:38, s. 21990-219971932-74471932-7455

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