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Trimethylboron as S...
Trimethylboron as Single-Source Precursor for Boron-Carbon Thin Film Synthesis by Plasma Chemical Vapor Deposition
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- Imam, Mewlude (författare)
- Linköping University
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- Höglund, Carina (författare)
- Linköpings universitet,Linköping University,Lund University,Lunds universitet,European Spallation Source ESS AB,Stiftelser och övriga anknutna verksamheter,Other Institutions and Utilities,Tekniska fakulteten,Tunnfilmsfysik,European Spallat Source ERIC, Sweden
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- Jensen, Jens (författare)
- Linköpings universitet,Linköping University,Tunnfilmsfysik,Tekniska fakulteten
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- Schmidt, Susann (författare)
- Linköpings universitet,Linköping University,Tunnfilmsfysik,Tekniska fakulteten,European Spallat Source ERIC, Sweden
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- Ivanov, Ivan Gueorguiev (författare)
- Linköpings universitet,Linköping University,Halvledarmaterial,Tekniska fakulteten
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- Hall-Wilton, Richard J. (författare)
- Mid Sweden University,Lund University,Lunds universitet,Mittuniversitetet,Avdelningen för elektronikkonstruktion,European Spallat Source ERIC, Lund,European Spallation Source ESS AB,Stiftelser och övriga anknutna verksamheter,Other Institutions and Utilities,European Spallat Source ERIC, Sweden; Mid Sweden University, Sweden
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- Birch, Jens (författare)
- Linköpings universitet,Linköping University,Tunnfilmsfysik,Tekniska fakulteten
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- Pedersen, Henrik (författare)
- Linköpings universitet,Linköping University,Kemi,Tekniska fakulteten
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- Maiwulidan, Yimamu (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,European Spallat Source ERIC, Sweden
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(creator_code:org_t)
- 2016-09-16
- 2016
- Engelska.
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Ingår i: The Journal of Physical Chemistry C. - : American Chemical Society (ACS). - 1932-7447 .- 1932-7455. ; 120:38, s. 21990-21997
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Abstract
Ämnesord
Stäng
- Boron carbon (BxC) thin films are potential neutron converting layers for B-10-based neutron detectors. However, as common material choices for such detectors do not tolerate temperatures above 500 degrees C, a low temperature deposition route is required. Here, we study trimethylboron B(CH3)(3) (TMB) as a single-source precursor for the deposition of BxC thin films by plasma CVD using Ar plasma. The effect of plasma power, TMB/Ar flow ratio and total pressure, on the film composition, morphology, chemical bonding, and microstructures are investigated. Dense and boron-rich films (B/C = 1.9) are achieved at high TMB flow under a low total pressure and high plasma power, which rendered an approximate substrate temperature of similar to 300 degrees C. Films mainly contain B-C bonds with the presence of B-O and C-C, which is attributed to be the origin of formed amorphous carbon in the films. The high H content 15 +/- 5 at. %) is almost independent of deposition parameters and contributed to lower the film density (2.16 g/cm(3)). The plasma compositional analysis shows that the TMB molecule decomposes to mainly atomic H, C-2, BH, and CH. A plasma chemical model for the decomposition of TMB with BH and CH as the plausible film depositing species in the plasma is proposed.
Ämnesord
- NATURVETENSKAP -- Fysik -- Acceleratorfysik och instrumentering (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Accelerator Physics and Instrumentation (hsv//eng)
- NATURVETENSKAP -- Kemi -- Fysikalisk kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Physical Chemistry (hsv//eng)
- NATURVETENSKAP -- Kemi -- Oorganisk kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)
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- art (ämneskategori)
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