Macroscopic Layers of Chiral Plasmonic Nanoparticle Oligomers from Colloidal Lithography

Ogier, Robin,1987Dept Appl Phys, Chalmers, Gothenburg, Sweden,Chalmers tekniska högskola,Chalmers University of Technology (author)

Funding Agency:Chalmers Nanoscience and Nanotechnology Area of Advance
Optical near-field coupling between closely spaced plasmonic metal nanoparticles is important to a range of nanophotonic applications of high contemporary interest, including surface-enhanced molecular spectroscopy, nanooptical sensing, and various novel light-harvesting concepts. Here we report on monolayers of chiral heterotrimers and heterotetramers composed of closely spaced silver and/or gold nanodisks of different heights fabricated through facile hole-mask colloidal lithography. These quasi-three-dimensional oligomers are interesting for applications because they exhibit "hot" gaps and crevices of nanometric dimensions, a pronounced circular dichroism, and optical chirality in the visible to near-infrared wavelength range, and they can be produced in large ensembles (>109) of identical orientation. We analyze the optical properties of the samples based on simulation results and find that the circular dichroism is due to strong near-field coupling and intricate phase retardation effects originating in the three-dimensional character of the individual oligomers.

Fang, Yurui,1983Dept Appl Phys, Chalmers, Gothenburg, Sweden,Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)yurui (author)
Svedendahl, Mikael,1984Dept Appl Phys, Chalmers, Gothenburg, Sweden,Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)smikael (author)
Johansson, Peter,1961-Örebro universitet,Institutionen för naturvetenskap och teknik,Dept Appl Phys, Chalmers, Gothenburg, Sweden,Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)petjo (author)
Käll, Mikael,1963Dept Appl Phys, Chalmers, Gothenburg, Sweden,Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)kall (author)
Dept Appl Phys, Chalmers, Gothenburg, SwedenChalmers tekniska högskola (creator_code:org_t)

By the author/editor: Ogier, Robin, 19 ...; Fang, Yurui, 198 ...; Svedendahl, Mika ...; Johansson, Peter ...; Käll, Mikael, 19 ...

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