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  • He, HansChalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden (författare)

Polymer-encapsulated molecular doped epigraphene for quantum resistance metrology

  • Artikel/kapitelEngelska2019

Förlag, utgivningsår, omfång ...

  • 2019-06-28
  • Institute of Physics Publishing,2019
  • printrdacarrier

Nummerbeteckningar

  • LIBRIS-ID:oai:DiVA.org:ri-39831
  • https://urn.kb.se/resolve?urn=urn:nbn:se:ri:diva-39831URI
  • https://doi.org/10.1088/1681-7575/ab2807DOI
  • https://research.chalmers.se/publication/512651URI
  • https://research.chalmers.se/publication/511339URI
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-158920URI

Kompletterande språkuppgifter

  • Språk:engelska
  • Sammanfattning på:engelska

Ingår i deldatabas

Klassifikation

  • Ämneskategori:ref swepub-contenttype
  • Ämneskategori:art swepub-publicationtype

Anmärkningar

  • Funding Agencies|Swedish-Korean Basic Research Cooperative Program of the NRF [NRF-2017R1A2A1A18070721]; Swedish Foundation for Strategic Research (SSF) [IS14-0053, GMT14-0077, RMA15-0024]; Swedish Research Council (VR); VINNOVA; Knut and Alice Wallenberg Foundation; Chalmers Area of Advance NANO; UK Department of Business, Energy and Industrial Strategy (BEIS); European Unions Horizon 2020 research and innovation programme [785219]
  • One of the aspirations of quantum metrology is to deliver primary standards directly to end-users thereby significantly shortening the traceability chains and enabling more accurate products. Epitaxial graphene grown on silicon carbide (epigraphene) is known to be a viable candidate for a primary realisation of a quantum Hall resistance standard, surpassing conventional semiconductor two-dimensional electron gases, such as those based on GaAs, in terms of performance at higher temperatures and lower magnetic fields. The bottleneck in the realisation of a turn-key quantum resistance standard requiring minimum user intervention has so far been the need to fine-tune the carrier density in this material to fit the constraints imposed by a simple cryo-magnetic system. Previously demonstrated methods, such as via photo-chemistry or corona discharge, require application prior to every cool-down as well as specialist knowledge and equipment. To this end we perform metrological evaluation of epigraphene with carrier density tuned by a recently reported permanent molecular doping technique. Measurements at two National Metrology Institutes confirm accurate resistance quantisation below 5n-1. Furthermore, samples show no significant drift in carrier concentration and performance on multiple thermal cycles over three years. This development paves the way for dissemination of primary resistance standards based on epigraphene

Ämnesord och genrebeteckningar

Biuppslag (personer, institutioner, konferenser, titlar ...)

  • Lara Avila, Samuel,1983Chalmers University of Technology, Sweden; National Physical Laboratory, UK,Chalmers tekniska högskola,National Physical Laboratory (NPL),Chalmers Univ Technol, Sweden; Natl Phys Lab, England(Swepub:cth)larsavil (författare)
  • Kim, Kyung Ho,1984Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden(Swepub:cth)kyungh (författare)
  • Fletcher, NickNPL National Physical Laboratory, UK,National Physical Laboratory (NPL),Natl Phys Lab, England (författare)
  • Rozhko, SergiyNPL National Physical Laboratory, UK,National Physical Laboratory (NPL),Natl Phys Lab, England (författare)
  • Bergsten, TobiasRISE,Mätteknik,RISE Research Institutes of Sweden,RISE Res Inst Sweden, Sweden(Swepub:ri)TobiasBe@ri.se (författare)
  • Eklund, GunnarRISE,Mätteknik,RISE Research Institutes of Sweden,RISE Res Inst Sweden, Sweden(Swepub:ri)gunnare@ri.se (författare)
  • Cedergren, Karin,1975RISE,Mätteknik,RISE Research Institutes of Sweden,RISE Res Inst Sweden, Sweden(Swepub:cth)karince (författare)
  • Yakimova, RositsaLinköpings universitet,Halvledarmaterial,Tekniska fakulteten(Swepub:liu)rosia15 (författare)
  • Park, YungSeoul National University, South Korea; University of Pennsylvania, US,University of Pennsylvania,Seoul Natl Univ, South Korea; Univ Penn, PA 19104 USA (författare)
  • Tzalenchuk, AlexanderNPL National Physical Laboratory, UK,National Physical Laboratory (NPL),Royal Holloway University of London,Natl Phys Lab, England; Royal Holloway Univ London, England (författare)
  • Kubatkin, Sergey,1959Chalmers University of Technology, Sweden; University of London, UK,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden(Swepub:cth)kubatkin (författare)
  • Chalmers University of Technology, SwedenChalmers tekniska högskola (creator_code:org_t)

Sammanhörande titlar

  • Ingår i:Metrologia: Institute of Physics Publishing56:40026-13941681-7575

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