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Sökning: WFRF:(Lara Avila Samuel 1983) > Scalable Fabricatio...

  • Shetty, Naveen,1988Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden (författare)

Scalable Fabrication of Edge Contacts to 2D Materials : Implications for Quantum Resistance Metrology and 2D Electronics

  • Artikel/kapitelEngelska2023

Förlag, utgivningsår, omfång ...

  • 2023-03-30
  • American Chemical Society,2023
  • printrdacarrier

Nummerbeteckningar

  • LIBRIS-ID:oai:DiVA.org:ri-64337
  • https://urn.kb.se/resolve?urn=urn:nbn:se:ri:diva-64337URI
  • https://doi.org/10.1021/acsanm.3c00652DOI
  • https://research.chalmers.se/publication/535361URI
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-193431URI

Kompletterande språkuppgifter

  • Språk:engelska
  • Sammanfattning på:engelska

Ingår i deldatabas

Klassifikation

  • Ämneskategori:ref swepub-contenttype
  • Ämneskategori:art swepub-publicationtype

Anmärkningar

  •  Funding details: 2018-04962, 2021-05252; Funding details: H2020 Marie Skłodowska-Curie Actions, MSCA, 766025; Funding details: Stiftelsen för Strategisk Forskning, SSF, 2019-00068, FFL21-0129, GMT14-0077, RMA15-0024; Funding details: Knut och Alice Wallenbergs Stiftelse, 2019.0140; Funding text 1: This work was jointly supported by the Swedish Foundation for Strategic Research (SSF) (Nos. GMT14-0077, RMA15-0024, and FFL21-0129), Chalmers Area of Advance Nano, Chalmers Area of Advance Energy, 2D TECH VINNOVA competence Center (Ref. 2019-00068), Marie Sklodowska-Curie grant QUESTech No. 766025, Knut and Alice Wallenberg Foundation (2019.0140), and the Swedish Research Council VR (Contract Nos. 2021-05252 and 2018-04962). This work was performed in part at Myfab Chalmers and Chalmers Materials Analysis Laboratory (CMAL). The authors declare that the main data supporting the findings of this study are available within the article and supplementary information. Additional data are available from the corresponding author upon request.
  • Funding Agencies|Swedish Foundation for Strategic Research (SSF) [GMT14-0077, RMA15-0024, FFL21-0129]; Chalmers Area of Advance Nano, Chalmers Area of Advance Energy, 2D TECH VINNOVA competence Center [2019-00068]; Marie Sklodowska-Curie [766025]; Knut and Alice Wallenberg Foundation [2019.0140]; Swedish Research Council VR [2021-05252, 2018-04962]
  • We report a reliable and scalable fabrication method for producing electrical contacts to two-dimensional (2D) materials based on the tri-layer resist system. We demonstrate the applicability of this method in devices fabricated on epitaxial graphene on silicon carbide (epigraphene) used as a scalable 2D material platform. For epigraphene, data on nearly 70 contacts result in median values of the one-dimensional (1D) specific contact resistances ρc ∼ 67 Ω·μm and follow the Landauer quantum limit ρc ∼ n-1/2, consistently reaching values ρc < 50 Ω·μm at high carrier densityn. As a proof of concept, we apply the same fabrication method to the transition metal dichalcogenide (TMDC) molybdenum disulfide (MoS2). Our edge contacts enable MoS2 field-effect transistor (FET) behavior with an ON/OFF ratio of >106 at room temperature (>109 at cryogenic temperatures). The fabrication route demonstrated here allows for contact metallization using thermal evaporation and also by sputtering, giving an additional flexibility when designing electrical interfaces, which is key in practical devices and when exploring the electrical properties of emerging materials. © 2023 The Authors. 

Ämnesord och genrebeteckningar

Biuppslag (personer, institutioner, konferenser, titlar ...)

  • He, HansRISE,Mätteknik,Chalmers University of Technology, Sweden,Chalmers tekniska högskola,RISE Research Institutes of Sweden,Chalmers Univ Technol, Sweden; RISE Res Inst Sweden, Sweden(Swepub:cth)hanshe (författare)
  • Mitra, Richa,1992Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden(Swepub:cth)richa (författare)
  • Huhtasaari, Johanna,1999Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden(Swepub:cth)johhuh (författare)
  • Iordanidou, Konstantina,1989Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden(Swepub:cth)konior (författare)
  • Wiktor, Julia,1988Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden(Swepub:cth)wiktorj (författare)
  • Kubatkin, Sergey,1959Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden(Swepub:cth)kubatkin (författare)
  • Dash, Saroj Prasad,1975Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden(Swepub:cth)saroj (författare)
  • Yakimova, RositsaLinköpings universitet,Halvledarmaterial,Tekniska fakulteten,Linköping University, Sweden(Swepub:liu)rosia15 (författare)
  • Zeng, Lunjie,1983Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden(Swepub:cth)lunjie (författare)
  • Olsson, Eva,1960Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden(Swepub:cth)f10eva (författare)
  • Lara Avila, Samuel,1983Chalmers University of Technology, Sweden; NPL National Physical Laboratory, UK,Chalmers tekniska högskola,National Physical Laboratory (NPL),Chalmers Univ Technol, Sweden; Natl Phys Lab, England(Swepub:cth)larsavil (författare)
  • Chalmers University of Technology, SwedenChalmers tekniska högskola (creator_code:org_t)

Sammanhörande titlar

  • Ingår i:ACS Applied Nano Materials: American Chemical Society6:7, s. 6292-2574-0970

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