Microstructure and electrical properties of Ti-Si-C-Ag nanocomposite thin films

• Ti-Si-C-Ag nanocomposite coatings consisting of nanocrystalline TiC in an amorphous Si matrix with segregated Ag were deposited by dual magnetron sputtering from Ti3SiC2 and Ag targets. As evidenced by X-ray diffraction, scanning electron microscopy, and transmission electron microscopy, for Ag contents below 10 at.%, the Ag forms similar to 10 nm large crystallites that are homogeneously distributed in the films. For higher Ag contents, coalescence during growth results in the formation of > similar to 100 nm Ag islands on the film surface. The electrical resistivity of the coatings was measured in a four-point-probe setup, and ranged from 340 mu Omega cm (for Ti-Si-C coatings without Ag) to 40 mu Omega cm (for high Ag content).

Ämnesord

NATURVETENSKAP  -- Kemi (hsv//swe)

NATURAL SCIENCES  -- Chemical Sciences (hsv//eng)

Nyckelord

sputtering

titanium carbide

silver

resistivity

X-ray diffraction

electron microscopy

Chemistry

Kemi

TECHNOLOGY

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