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Thermodynamic pathway for the formation of SnSe and SnSe2 polycrystalline thin films by selenization of metal precursors

Fernandes, P. A. (författare)
Sousa, M. G. (författare)
Salome, Pedro M. P. (författare)
Uppsala universitet,Fasta tillståndets elektronik
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Leitao, J. P. (författare)
da Cunha, A. F. (författare)
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 (creator_code:org_t)
Royal Society of Chemistry (RSC), 2013
2013
Engelska.
Ingår i: CrystEngComm. - : Royal Society of Chemistry (RSC). - 1466-8033 .- 1466-8033. ; 15:47, s. 10278-10286
  • Tidskriftsartikel (refereegranskat)
Abstract Ämnesord
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  • In this work, tin selenide thin films (SnSex) were grown on soda lime glass substrates by selenization of dc magnetron sputtered Sn metallic precursors. Selenization was performed at maximum temperatures in the range 300 degrees C to 570 degrees C. The thickness and the composition of the films were analysed using step profilometry and energy dispersive spectroscopy, respectively. The films were structurally and optically investigated by X-ray diffraction, Raman spectroscopy and optical transmittance and reflectance measurements. X-Ray diffraction patterns suggest that for temperatures between 300 degrees C and 470 degrees C, the films are composed of the hexagonal-SnSe2 phase. By increasing the temperature, the films selenized at maximum temperatures of 530 degrees C and 570 degrees C show orthorhombic-SnSe as the dominant phase with a preferential crystal orientation along the (400) crystallographic plane. Raman scattering analysis allowed the assignment of peaks at 119 cm(-1) and 185 cm(-1) to the hexagonal-SnSe2 phase and those at 108 cm(-1), 130 cm(-1) and 150 cm(-1) to the orthorhombic-SnSe phase. All samples presented traces of condensed amorphous Se with a characteristic Raman peak located at 255 cm(-1). From optical measurements, the estimated band gap energies for hexagonal-SnSe2 were close to 0.9 eV and 1.7 eV for indirect forbidden and direct transitions, respectively. The samples with the dominant orthorhombic-SnSe phase presented estimated band gap energies of 0.95 eV and 1.15 eV for indirect allowed and direct allowed transitions, respectively.

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Engineering Science with specialization in Electronics
Teknisk fysik med inriktning mot elektronik

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