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  • Sundberg, JillUppsala universitet,Oorganisk kemi (author)

Understanding the effects of sputter damage in W–S thin films by HAXPES

  • Article/chapterEnglish2014

Publisher, publication year, extent ...

  • Elsevier,2014
  • printrdacarrier

Numbers

  • LIBRIS-ID:oai:DiVA.org:uu-224513
  • https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-224513URI
  • https://doi.org/10.1016/j.apsusc.2014.03.038DOI

Supplementary language notes

  • Language:English
  • Summary in:English

Part of subdatabase

Classification

  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • WS2 is an excellent solid lubricant in dry conditions, and can be applied as thin films. The analysis of WS2 and WS2-based films by x-ray photoelectron spectroscopy (XPS) can be challenging, due to contaminationand oxidized material on the surface. The investigations have traditionally therefore included sputter etching by ion bombardment, which however leads to changes of the remaining material. In this study, hard x-ray photoelectron spectroscopy (HAXPES) has been used to study W–S films deposited bymagnetron sputtering. High-resolution reference measurements for crystalline WS2 and metallic W are also presented. The W–S films were analyzed before and after sputter cleaning by Ar+ ion bombardment, using photon energies of 3 and 6 keV. The as-deposited films were found to consist mainly of a WSx phase,similar to WS2 but with a broader range of chemical states. It is shown that ion bombardment of the surface not only removes the outermost oxidized material, but also leads to preferential sputtering of sulfur and the formation of metallic tungsten. The results are of strong interest for the analysis of WS2-based materials, as they demonstrate that spectra from sputter-cleaned films include effects of sputter damage,and may not be representative of the original sample.

Subject headings and genre

Added entries (persons, corporate bodies, meetings, titles ...)

  • Lindblad, RebeckaUppsala universitet,Molekyl- och kondenserade materiens fysik(Swepub:uu)rebsc244 (author)
  • Gorgoi, Mihaela (author)
  • Rensmo, HåkanUppsala universitet,Molekyl- och kondenserade materiens fysik(Swepub:uu)hakanrm (author)
  • Jansson, UlfUppsala universitet,Oorganisk kemi(Swepub:uu)uja03434 (author)
  • Lindblad, AndreasUppsala universitet,Oorganisk kemi,Molekyl- och kondenserade materiens fysik(Swepub:uu)anlin087 (author)
  • Uppsala universitetOorganisk kemi (creator_code:org_t)

Related titles

  • In:Applied Surface Science: Elsevier305, s. 203-2130169-43321873-5584

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