L773:1520 8559 OR L773:0734 2101
Search: L773:1520 8559 OR L773:0734 2101 > Silicon etching in ...
- 37 of 243
- Previous record
- Next record
- To hitlist
Silicon etching in a direct current glow discharge of CF4/O2 and NF3/O2
- Blom, Hans-Olof (author)
-
- Berg, Sören (author)
- Uppsala universitet,Fasta tillståndets elektronik
- Nender, C (author)
- show more...
- Norström, H (author)
- show less...
- (creator_code:org_t)
- 1989
- 1989
- English.
- In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - 0734-2101 .- 1520-8559. ; 7:6, s. 1321-1324
- Journal article (peer-reviewed)
Subject headings
Close
Publication and Content Type
- ref (subject category)
- art (subject category)
Find in a library
- Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films (Search for host publication in LIBRIS)
To the university's database
- 37 of 243
- Previous record
- Next record
- To hitlist
Find more in SwePub
- By the author/editor
- Blom, Hans-Olof
- Berg, Sören
- Nender, C
- Norström, H
- Articles in the publication
- Journal of Vacuu ...
- By the university
- Uppsala University
Search outside SwePub
- Extend your search to:
- Google Book Search
- Google Scholar
Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.
- Copyright © LIBRIS - National Library Systems
- LIBRIS.kb.se
